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T. Greibe

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cond-mat.mes-hall cond-mat.supr-con

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preprint2014arXiv

Direct observation of the thickness distribution of ultra thin AlOx barrier in Al/AlOx/Al Josephson junctions

We show that less than 10% of the barrier area dominates the electron tunneling in state-of-art Al/AlOx/Al Josephson junctions. They have been studied by transmission electron microscopy, specifically using atomic resolution annular dark field (ADF) scanning transmission electron microscopy (STEM) imaging. The direct observation of the local barrier thickness shows a Gaussian distribution of the barrier thickness variation along the junction, from ~1 nm to ~2 nm in the three junctions we studied. We have investigated how the thickness distribution varies with oxygen pressure (po) and oxidation time (to) and we find, in agreement with resistance measurements on similar junctions, that an increased to gives a thicker barrier than an increased po.

preprint2002arXiv

Phase control in La-214 epitaxial thin films

The lanthanide (Ln) copper oxides of the general chemical formula Ln2CuO4 take two different crystal structures: K2NiF4(T) and Nd2CuO4(T'). La2CuO4 takes the T structure by high-temperature bulk processes. The "thermal expansion mismatch" between the La-O and Cu-O bonds predicts that the T' phase of La2CuO4 can be stabilized at synthesis temperatures below 425 deg. Such low synthesis temperatures are difficult to access by bulk processes, but easy by thin-film processes. We have surveyed growth parameters in molecular beam epitaxy, and succeeded in the selective stabilization of T- and T'-La2CuO4. From our observations, it turns out that the growth temperature as well as the substrate play a crucial role in the selective stabilization: the T' structure is stabilized at low growth temperatures (< 600 deg.) and with substrates of a < 3.70 Ang or a > 3.90 Ang, while the T structure is stabilized at high growth temperatures (> 650 deg) or with substrates of a ~ 3.70 - 3.85 Ang. We have also been attempting hole (Ca, Sr, and Ba) and electron (Ce) doping into both of T- and T'-La2CuO4. In T-La2CuO4, hole doping produces the well-known LSCO and LBCO. Surprisingly, contrary to the empirical law, electron doping is also possible up to x ~ 0.06 - 0.08, although the films do not show superconductivity. In T'-La2CuO4, electron doping produces superconducting T'-(La,Ce)2CuO4 with Tc ~ 30 K, although hole doping has as yet been unsuccessful.