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Shao-Wei Wang

Shao-Wei Wang contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2016arXiv

Broadband Circular Polarizers Constructed by Helix-like Chiral Metamaterials

In this paper, a kind of helix-like chiral metamaterial, which can be realized with multiple conventional lithography or electron beam lithographic techniques, is proposed to achieve broadband bianisotropic optical response analogous to helical metamaterial. On the basis of twisted metamaterial, via tailoring the relative orientation within the lattice, the anisotropy of arc is converted into magneto-electric coupling of closely spaced arc pairs, which leads to a broad bianisotropic optical response. By connecting the adjacent upper and lower arcs, the coupling of metasurface pairs is transformed to the coupling of the three-dimensional inclusions, and provides a much broader and higher bianisotropic optical response. For only a four-layer helix-like metamaterial, the maximum extinction ratio can reach 19.7. The operation band is in the wavelength range from 4.69 μm to 8.98 μm with an average extinction ratio of 6.9. And the transmittance for selective polarization is above 0.8 in the entire operation band. Such a structure is promising for integratable and scalable broadband circular polarizers, especially has great potential to act as broadband circular micropolarizers in the field of the full-stokes division of focal plane polarimeters.

preprint2016arXiv

Interference-aided spectrum fitting method for accurately film thickness determination

A new approach was proposed to accurately determine the thickness of film, especially for ultra-thin film, through spectrum fitting with the assistance of interference layer. The determination limit can reach even less than 1 nm. Its accuracy is far better than traditional methods. This determination method is verified by experiments and the determination limit is at least 3.5 nm compared with the results of AFM. Furthermore, double-interference-aided spectra fitting method is proposed to reduce the requirements of determination instruments, which allow one to determine the film thickness with a low precision common spectrometer and largely lower the cost. It is a very high precision determination method for on-site and in-situ applications, especially for ultra-thin films.