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S. T. F. Hale

S. T. F. Hale appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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Published work

2 published item(s)

preprint2012arXiv

Many-body effects on the capacitance of multilayers made from strongly correlated materials

Recent work by Kopp and Mannhart on novel electronic systems formed at oxide interfaces has shown interesting effects on the capacitances of these devices. We employ inhomogeneous dynamical mean-field theory to calculate the capacitance of multilayered nanostructures. These multilayered nanostructures are composed of semi-infinite metallic leads coupled via a strongly correlated dielectric barrier region. The barrier region can be adjusted from a metallic regime to a Mott insulator through adjusting the interaction strength. We examine the effects of varying the barrier width, temperature, potential difference, screening length, and chemical potential. We find that the interaction strength has a relatively strong effect on the capacitance, while the potential and temperature show weaker dependence.

preprint2010arXiv

Effect of vertex corrections on the longitudinal transport through multilayered nanostructures: Exact dynamical mean-field theory approach applied to the inhomogeneous Falicov-Kimball model

Inhomogeneous dynamical mean-field theory is employed to calculate the vertex-corrected electronic charge transport for multilayered devices composed of semi-infinite metallic lead layers coupled through a strongly correlated material barrier region. The barrier region can be tuned from a metal to a Mott insulator through adjusting the interaction strength and the particle filling. We use the Falicov-Kimball model to describe the barrier region because an exact expression for the vertex corrections is known, allowing us to determine their effect on transport. The dc conductivity is calculated and we find the effects of the vertex corrections are relatively small, manifesting themselves in a small reduction in the resistance-area product. This reduction saturates in absolute magnitude as the barrier layer becomes thick, as expected due to the vanishing nature of the vertex corrections in bulk. The vertex corrections have a larger relative effect on the resistance-area product for more metallic and thinner devices.