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R. Kronholm

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Published work

2 published item(s)

preprint2020arXiv

Experimental evidence on photo-assisted O$^-$ ion production from Al$_2$O$_3$ cathode in cesium sputter negative ion source

The production of negative ions in cesium sputter ion sources is generally considered to be a pure surface process. It has been recently proposed that ion pair production could explain the higher-than-expected beam currents extracted from these ion sources, therefore opening the door for laser-assisted enhancement of the negative ion yield. We have tested this hypothesis by measuring the effect of various pulsed diode lasers on the O$^-$ beam current produced from Al$_2$O$_3$ cathode of a cesium sputter ion source. It is expected that the ion pair production of O$^-$ requires populating the 5d electronic states of neutral cesium, thus implying that the process should be provoked only with specific wavelengths. Our experimental results provide evidence for the existence of a wavelength-dependent photo-assisted effect but cast doubt on its alleged resonant nature as the prompt enhancement of beam current can be observed with laser wavelengths exceeding a threshold photon energy. The beam current transients observed during the laser pulses suggest that the magnitude and longevity of the beam current enhancement depends on the cesium balance on the cathode surface. We conclude that the photo-assisted negative ion production could be of practical importance as it can more than double the extracted beam current under certain operational settings of the ion source.

preprint2015arXiv

VUV irradiance measurement of a 2.45 GHz microwave-driven hydrogen discharge

Absolute values of VUV-emission of a 2.45 GHz microwave-driven hydrogen discharge are reported. The measurements were performed with a robust and straightforward method based on a photodiode and optical filters. It was found that the volumetric photon emission rate in the VUV-range (80-250 nm) is $10^{16}$-$10^{17}$ 1/cm$^3$s, which corresponds to approximately 8% dissipation of injected microwave power by VUV photon emission. The volumetric emission of characteristic emission bands was utilized to diagnostics of molecular plasma processes including volumetric rates of ionization, dissociation and excitation to high vibrational levels and metastable states. The estimated reaction rates imply that each injected molecule experiences several inelastic electron impact collisions. The upper limit for the total density of metastable neutrals ($2S$ atoms and $c^3Π_u$ molecules) was estimated to be approximately 0.5% of the neutral gas density.