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Researcher profile

N. Venkataramani

N. Venkataramani contributes to research discovery and scholarly infrastructure.

ResearcherAffiliation not importedOpen to collaborate
cond-mat.str-elcond-mat.mtrl-sci

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Published work

4 published item(s)

preprint2010arXiv

Superparamagnetism in Nanocrystalline Copper Ferrite Thin Films

The rf sputtered copper ferrite films contain nanocrystalline grains. In these films, the magnetization does not saturate even in high magnetic fields. This phenomenon of high field susceptibility is attributed to the defects and/or superparamagnetic grains in the films. A simple model is developed to describe the observed high field magnetization behavior of these films. The model is found to fit well to the high field part for all the studied films. An attempt is also made to explain the temperature variation of the ferrimagnetic contribution on the basis of reported exchange constants.

0 citations0 reviewsNo code linkedOpen access
preprint2010arXiv

Temperature dependence of Magnetic properties in Nanocrystalline copper ferrite thin films

The copper ferrite thin films have been deposited by RF sputtering at a 50W rf power. The As-deposited films are annealed in air at $800^{\circ}$C and then slow cooled. The As-deposited (AD) as well as slow cooled (SC) films are studied using a SQUID Magnetometer. The M Vs H curves have been recorded at various temperatures between 5K to 300K. The coercivities obtained from the MH curves are then plotted against temperature (T). The magnetization in the films does not saturate, even at the highest field of 7T. The high field part of the M Vs H curves is fitted using the H1/2 term of Chikazumi expression M(H)= Q*(1- a /Hn), with n=1/2. The variation of coefficient 'a' of H1/2 term has been observed with temperature (T). An attempt has been made to correlate this with the coercivity (Hc) in the case of annealed films.

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preprint2010arXiv

The High Field Magnetization in the RF Sputter Deposited Copper Ferrite Thin Films

Copper ferrite thin films were deposited on amorphous quartz substrates. The as deposited films were annealed in air and either quenched or slow cooled. Magnetization studies were carried out on the as deposited as well as annealed films using a SQUID magnetometer. The M-H curves were measured up to a field of 7T, at temperatures varying from 5K to 300K. The magnetization in the films did not saturate, even at the highest field. The expression, M(H)= Q(1- a/H^n) fitted the approach to saturation best with n=1/2, for all films and at all temperatures. The coefficient a was the highest for the as deposited film and was the smallest for the quenched film. In the case of as deposited film, the value of coefficient a increased with increasing temperature, while for the annealed films, the value of a showed a decrease as temperature increases.

0 citations0 reviewsNo code linkedOpen access
preprint2010arXiv

Transmission Electron Microscopy Studies on RF Sputtered Copper Ferrite Thin Films

Copper ferrite thin films were rf sputtered at a power of 50W. The as deposited films were annealed in air at 800°C and slow cooled. The transmission electron microscope (TEM) studies were carried out on as deposited as well as on slow cooled film. Significantly larger defect concentration, including stacking faults, was observed in 50W as deposited films than the films deposited at a higher rf power of 200W. The film annealed at 800°C and then slow cooled showed an unusual grain growth upto 180nm for a film thickness of ~240nm. These grains showed Kikuchi pattern.

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