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Michael Pellin

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Published work

2 published item(s)

preprint2015arXiv

Analysis of Nb3Sn surface layers for superconducting RF cavity applications

We present an analysis of the Nb3Sn surface layers grown on a bulk niobium (Nb) coupon prepared at the same time and by the same vapor diffusion process used to make Nb3Sn coatings on 1.3 GHz cavities. Tunneling spectroscopy reveals a well-developed, homogeneous superconducting density of states at the surface with a gap value distribution centered around 2.7 meV and superconducting critical temperature (Tc) up to 16.3 K. Scanning Electron microscopy (STEM) performed on cross section of the sample's surface region shows a 2 microns thick Nb3Sn surface layer. The elemental composition map exhibits a Nb over Sn ratio of 3 and reveals the presence of buried sub-stoichiometric regions that have a ratio f 5. Synchrotron x-ray diffraction experiments indicate a polycrystalline Nb3Sn film and confirm the presence of Nb rich regions that occupy about a third of the coating volume. These low Tc regions could play an important role in the dissipation mechanism occurring during RF tests of Nb3Sn-coated cavities and open the way for further improving a very promising alternative to pure Nb cavities for particle accelerators.

preprint2011arXiv

Atomic layer deposition and superconducting properties of NbSi films

Atomic layer deposition was used to synthesize niobium silicide (NbSi) films with a 1:1 stoichiometry, using NbF5 and Si2H6 as precursors. The growth mechanism at 200oC was examined by in-situ quartz crystal microbalance (QCM) and quadrupole mass spectrometer (QMS). This study revealed a self-limiting reaction with a growth rate of 4.5 Å/cycle. NbSi was found to grow only on oxide-free films prepared using halogenated precursors. The electronic properties, growth rate, chemical composition, and structure of the films were studied over the deposition temperature range 150-400oC. For all temperatures, the films are found to be stoichiometric NbSi (1:1) with no detectable fluorine impurities, amorphous with a density of 6.65g/cm3, and metallic with a resistivity ρ=150 μΩ.cm at 300K for films thicker than 35 nm. The growth rate was nearly constant for deposition temperatures between 150-275oC, but increases above 300oC suggesting the onset of non-self limiting growth. The electronic properties of the films were measured down to 1.2K and revealed a superconducting transition at Tc=3.1K. To our knowledge, a superconducting niobium silicide film with a 1:1 stoichiometry has never been grown before by any technique.