Combined evanescent-wave excitation and supercritical-angle fluorescence detection improves optical sectioning
Evanescent-wave microscopy achieves sub-diffraction axial sectioning by confining fluorescence excitation to a thin layer close to the cell/substrate interface. How thin this light sheet exactly is, however, is often unknown. Particularly in the popular objective-type total internal reflection fluorescence microscopy (TIRFM) configuration large deviations from the expected exponential intensity decay of the evanescent wave have been reported. Propagating, i.e., non-evanescent, excitation light diminishes the optical sectioning effect, reduces contrast and renders the quantification of TIRFM images uncertain. Here, we use a combination of azimuthal- and polar-angle beam scanning, dark-field scatter imaging, and atomic force microscopy to identify the sources of this unwanted background fluorescence excitation. We identify stray light originating from the microscope optics and the objective lens itself as the major sources of background, with minor contributions due to evanescent-wave scattering at the reflecting interface and at refractive-index boundaries in the sample. Apart from evanescence in excitation light, light emitted from a fluorophore can also show observable effects of evanescence. Only fluorophores located close to the coverslip can couple their near-field radiation into propagating waves detectable at supercritical angles. We show that selectively detecting this supercritical-angle fluorescence (SAF) through a high-numerical aperture objective effectively rejects fluorescence from deeper sample regions and improves optical sectioning. The microscopy scheme presented here merges the benefits of TIRF excitation and SAF detection and provides the conditions for quantitative wide-field imaging of fluorophore dynamics at or near the plasma membrane.