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Researcher profile

Maarten L. Van de Put

Maarten L. Van de Put contributes to research discovery and scholarly infrastructure.

ResearcherAffiliation not importedOpen to collaborate
cond-mat.mes-hallcond-mat.mtrl-sciphysics.comp-ph

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Published work

4 published item(s)

preprint2022arXiv

Atomistic modeling of spin and electron dynamics in two-dimensional magnets switched by two-dimensional topological insulators

To design fast memory devices, we need material combinations which can facilitate fast read and write operation. We present a heterostructure comprising a two-dimensional (2D) magnet and a 2D topological insulator (TI) as a viable option for designing fast memory devices. We theoretically model spin-charge dynamics between the 2D magnets and 2D TIs. Using the adiabatic approximation, we combine the non-equilibrium Green's function method for spin-dependent electron transport, and time-quantified Monte-Carlo for simulating magnetization dynamics. We show that it is possible to switch the magnetic domain of a ferromagnet using spin-torque from spin-polarized edge states of 2D TI. We further show that the switching between TIs and 2D magnets is strongly dependent on the interface exchange ($J_{\mathrm{int}}$), and an optimal interface exchange depending on the exchange interaction within the magnet is required for efficient switching. Finally, we compare the experimentally grown Cr-compounds and show that Cr-compounds with higher anisotropy (such as $\rm CrI_3$) results in lower switching speed but more stable magnetic order.

0 citations0 reviewsNo code linkedOpen access
preprint2022arXiv

Theoretical Study of Electronic Transport in Two-Dimensional Transition Metal Dichalcogenides: Effects of the Dielectric Environment

We discuss the effect of the dielectric environment (insulators and metal gates) on electronic transport in two-dimensional (2D) transition metal dichalcogenides (TMD) monolayers. We employ well-known ab initio methods to calculate the low-field carrier mobility in free-standing layers and use the dielectric continuum approximation to extend our study to layers in double-gate structures, including the effects of dielectric screening of the electron-phonon interaction caused by the bottom oxide and the gate insulator, and of scattering with hybrid interface optical-phonon/plasmon excitations (`remote phonon scattering'). We find that the presence of insulators with a high dielectric constant may improve significantly the carrier mobility. However, scattering with the interface hybrid excitations negates this gain and degrades the mobility significantly below its free-standing value. In a double-gate geometry with SiO$_{2}$ as bottom-oxide and various top-gate insulators, we find that the mobility decreases as the top-insulator dielectric constant increases, as expected. However, a high mobility is predicted in the case of the weakly polar hBN, and a mobility much lower than expected is calculated in the case of gate-insulator/TMD/bottom-oxide stacks in which two or more polar materials have optical-phonon with similar resonating frequencies. We also find that the effect of screening by metal gates is noticeable but not particularly strong. Finally, we discuss the effect of the TMD dielectric constant, of the free-carrier density, and of temperature on the transport properties of TMD monolayers.

0 citations0 reviewsNo code linkedOpen access
preprint2022arXiv

Transition-Metal Nitride Halide Dielectrics for Transition-Metal Dichalcogenide Transistors

Using first-principles calculations, we investigate six transition-metal nitride halides (TMNHs): HfNBr, HfNCl, TiNBr, TiNCl, ZrNBr, and ZrNCl as potential van der Waals (vdW) dielectrics for transition metal dichalcogenide (TMD) channel transistors. We calculate the exfoliation energies and bulk phonon energies and find that the six TMNHs are exfoliable and thermodynamically stable. We calculate both the optical and static dielectric constants in the in-plane and out-of-plane directions for both monolayer and bulk TMNHs. In monolayers, the out-of-plane static dielectric constant ranges from 5.04 (ZrNCl) to 6.03 (ZrNBr) whereas in-plane dielectric constants range from 13.18 (HfNBr) to 74.52 (TiNCl). We show that the bandgap of TMNHs ranges from 1.53 eV (TiNBr) to 3.36 eV (HfNCl) whereas the affinity ranges from 4.01 eV (HfNBr) to 5.60 eV (TiNCl). Finally, we estimate the dielectric leakage current density of transistors with six TMNH monolayer dielectrics with five monolayer channel TMDs (MoS2, MoSe2, MoTe2, WS2, and WSe2). For p-MOS TMD channel transistors, 19 out of 30 combinations have a smaller leakage current compared to monolayer hexagonal boron nitride (hBN), a well-known vdW dielectric. The smallest monolayer leakage current of 2.14*10-9 A/cm2 is predicted for a p-MOS WS2 transistor with HfNCl as a gate dielectric. HfNBr, HfNCl, ZrNBr, and ZrNCl are also predicted to yield small leakage currents in certain p-MOS TMD transistors.

0 citations0 reviewsNo code linkedOpen access
preprint2020arXiv

Monte Carlo analysis of phosphorene nanotransistors

Experimental studies on two-dimensional (2D) materials are still in the early stages, and most of the theoretical studies performed to screen these materials are limited to the room-temperature carrier-mobility in the free standing 2D layers. With the dimensions of devices moving towards nanometer-scale lengths, the room-temperature carrier-mobility -- an equilibrium concept -- may not be the main quantity that controls the performance of devices based on these 2D materials, since electronic transport occurs under strong off--equilibrium conditions. Here we account for these non-equilibrium conditions and, for the case of monolayer phosphorene (monolayer black phosphorus), show the results of device simulations for a short channel n-MOSFET, using the Monte Carlo method coupled with the Poisson equation, including full bands and full electron-phonon matrix elements obtained from density functional theory. Our simulations reveal significant intrinsic limitations to the performance of phosphorene as a channel material in nanotransistors.

0 citations0 reviewsNo code linkedOpen access