Researcher profile

M. Wisse

M. Wisse contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2014arXiv

Pico- and nanosecond laser ablation of mixed tungsten / aluminium films

In order to extend the investigation of laser-assisted cleaning of ITER-relevant first mirror materials to the picosecond regime, a commercial laser system delivering 10 picosecond pulses at 355 nm at a frequency of up to 1 MHz has been used to investigate the ablation of mixed aluminium (oxide) / tungsten (oxide) layers deposited on poly- and nanocrystalline molybdenum as well as nanocrystalline rhodium mirrors. Characterization before and after cleaning using scanning electron microscopy (SEM) and spectrophotometry shows heavy dust formation, resulting in a degradation of the reflectivity. Cleaning using a 5 nanosecond pulses at 350 and 532 nm, on the other hand, proved very promising. The structure of the film remnants suggests that in this case buckling was the underlying removal mechanism rather than ablation. Repeated coating and cleaning using nanosecond pulses is demonstrated.

preprint2012arXiv

Laser damage thresholds of ITER mirror materials and first results on in situ laser cleaning of stainless steel mirrors

A laser ablation system has been constructed and used to determine the damage threshold of stainless steel, rhodium and single-, poly- and nanocrystalline molybdenum in vacuum, at a number of wavelengths between 220 and 1064 nm using 5 ns pulses. All materials show an increase of the damage threshold with decreasing wavelength below 400 nm. Tests in a nitrogen atmosphere showed a decrease of the damage threshold by a factor of two to three. Cleaning tests have been performed in vacuum on stainless steel samples after applying mixed Al/W/C/D coatings using magnetron sputtering. In situ XPS analysis during the cleaning process as well ex situ reflectivity measurements demonstrate near complete removal of the coating and a substantial recovery of the reflectivity. The first results also show that the reflectivity obtained through cleaning at 532 nm may be further increased by additional exposure to UV light, in this case 230 nm, an effect which is attributed to the removal of tungsten dust from the surface.