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M K Tiwari

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2 publications

preprint2014arXiv

Effect of Synchrotron Polarization in Grazing Incidence X-ray Fluorescence analysis

Total reflection x-ray fluorescence (TXRF) spectroscopy has seen a remarkable progress over the past years. Numerous applications in basic and applied sciences prove its importance. The large spectral background which is a major detrimental factor in the conventional x-ray fluorescence technique, limits the element detection sensitivities of the technique to ppm range. This spectral background reduces to a great extent in the TXRF technique due to the low extinction depth of the primary incident x-ray beam. In synchrotron radiation (SR) based TXRF measurements the spectral background reduces further because of the polarization of the synchrotron x-ray beam. Here, we discuss in detail the influence of synchrotron polarization on the spectral background in a fluorescence spectrum and its significance towards TXRF detection sensitivities. We provide a detailed theoretical description and show that how anisotropic scattering probability densities of the Compton and Elastic scattered x-rays depend on the scattering angle (θ) and azimuthal angle (ϕ) in the polarization plane of the SR beam.

preprint2014arXiv

Temporal Coherence in Surface x-ray Standing Waves

We present a unified elucidation for the role temporal coherence properties of x-rays in surface x-ray standing wave analysis, under total external reflection condition. Analytical formulas have been derived that provide a direct relation between the intensity distribution of x-ray standing wave (XSW) pattern and complex degree of coherence of the incoming x-rays. The novelty of the proposed method has been demonstrated experimentally together with the theoretical results for a real application by analyzing the distribution of metal nanoparticles on a Si mirror surface. Our results demonstrate that the modified XSW approach opens up an opportunity to unambiguously interpret structural studies of large dimension nanostructure materials of height 200nm (or more), deposited on a substrate surface.

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