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Konstantin K. Likharev

Konstantin K. Likharev contributes to research discovery and scholarly infrastructure.

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Published work

3 published item(s)

preprint2014arXiv

Training and Operation of an Integrated Neuromorphic Network Based on Metal-Oxide Memristors

Despite all the progress of semiconductor integrated circuit technology, the extreme complexity of the human cerebral cortex makes the hardware implementation of neuromorphic networks with a comparable number of devices exceptionally challenging. One of the most prospective candidates to provide comparable complexity, while operating much faster and with manageable power dissipation, are so-called CrossNets based on hybrid CMOS/memristor circuits. In these circuits, the usual CMOS stack is augmented with one or several crossbar layers, with adjustable two-terminal memristors at each crosspoint. Recently, there was a significant progress in improvement of technology of fabrication of such memristive crossbars and their integration with CMOS circuits, including first demonstrations of their vertical integration. Separately, there have been several demonstrations of discrete memristors as artificial synapses for neuromorphic networks. Very recently such experiments were extended to crossbar arrays of phase-change memristive devices. The adjustment of such devices, however, requires an additional transistor at each crosspoint, and hence the prospects of their scaling are less impressive than those of metal-oxide memristors, whose nonlinear I-V curves enable transistor-free operation. Here we report the first experimental implementation of a transistor-free metal-oxide memristor crossbar with device variability lowered sufficiently to demonstrate a successful operation of a simple integrated neural network, a single layer-perceptron. The network could be taught in situ using a coarse-grain variety of the delta-rule algorithm to perform the perfect classification of 3x3-pixel black/white images into 3 classes. We believe that this demonstration is an important step towards the implementation of much larger and more complex memristive neuromorphic networks.

preprint2012arXiv

Design and Simulation of Molecular Nonvolatile Single-Electron Resistive Switches

We have carried out a preliminary design and simulation of a single-electron resistive switch based on a system of two linear, parallel, electrostatically-coupled molecules: one implementing a single-electron transistor and another serving as a single-electron trap. To verify our design, we have performed a theoretical analysis of this "memristive" device, based on a combination of ab-initio calculations of the electronic structures of the molecules and the general theory of single-electron tunneling in systems with discrete energy spectra. Our results show that such molecular assemblies, with a length below 10 nm and a footprint area of about 5 nm$^2$, may combine sub-second switching times with multi-year retention times and high ($> 10^3$) ON/OFF current ratios, at room temperature. Moreover, Monte Carlo simulations of self-assembled monolayers (SAM) based on such molecular assemblies have shown that such monolayers may also be used as resistive switches, with comparable characteristics and, in addition, be highly tolerant to defects and stray offset charges.

preprint2010arXiv

Experimental Study of Resistive Bistability in Metal Oxide Junctions

We have studied resistive bistability (memory) effects in junctions based on metal oxides, with a focus on sample-to-sample reproducibility which is necessary for the use of such junctions as crosspoint devices of hybrid CMOS/nanoelectronic circuits. Few-nm-thick layers of NbOx, CuOx and TiOx have been formed by thermal and plasma oxidation, at various deposition and oxidation conditions, both with or without rapid thermal post-annealing (RTA). The resistive bistability effect has been observed for all these materials, with particularly high endurance (over 1000 switching cycles) obtained for single-layer TiO2 junctions, and the best reproducibility reached for multi-layer junctions of the same material. Fabrication optimization has allowed us to improve the OFF/ON resistance ratio to about 1000, but the sample-to-sample reproducibility is so far lower than that required for large scale integration.