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Kenneth J. Leedle

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Published work

6 published item(s)

preprint2022arXiv

High Gradient Silicon Carbide Immersion Lens Ultrafast Electron Sources

We present two compact ultrafast electron injector designs with integrated focusing that provide high peak brightness of up to $1.9*10^{12} A/m^2Sr^2$ with 10s of electrons per laser pulse using silicon carbide electrodes and silicon nanotip emitters. We demonstrate a few centimeter scale 96 keV immersion lens electron source and a 57 keV immersion lens electron source with a 19 kV/mm average acceleration gradient, nearly double the typical 10 kV/mm used in DC electron sources. The brightness of the electron sources is measured alongside start-to-end simulations including space charge effects. These sources are suitable for dielectric laser accelerator experiments, ultrafast electron diffraction, and other applications where a compact high brightness electron source is required.

preprint2020arXiv

Low Energy Spread Attosecond Bunching and Coherent Electron Acceleration in Dielectric Nanostructures

We demonstrate a compact technique to compress electron pulses to attosecond length, while keeping the energy spread reasonably small. The technique is based on Dielectric Laser Acceleration (DLA) in nanophotonic silicon structures. Unlike previous ballistic optical microbunching demonstrations, we use a modulator-demodulator scheme to compress phase space in the time and energy coordinates. With a second stage, we show that these pulses can be coherently accelerated, producing a net energy gain of $1.5\pm0.1$ keV, which is significantly larger than the remaining energy spread of $0.88 \,_{-0.2}^{+0.0}$ keV FWHM. We show that by linearly sweeping the phase between the two stages, the energy spectrum can be coherently moved in a periodic manner, while keeping the energy spread roughly constant. After leaving the buncher, the electron pulse is also transversely focused, and can be matched into a following accelerator lattice. Thus, this setup is the prototype injector into a scalable DLA based on Alternating Phase Focusing (APF).

preprint2019arXiv

On-chip integrated laser-driven particle accelerator

Particle accelerators represent an indispensable tool in science and industry. However, the size and cost of conventional radio-frequency accelerators limit the utility and reach of this technology. Dielectric laser accelerators (DLAs) provide a compact and cost-effective solution to this problem by driving accelerator nanostructures with visible or near-infrared (NIR) pulsed lasers, resulting in a 10$^4$ reduction of scale. Current implementations of DLAs rely on free-space lasers directly incident on the accelerating structures, limiting the scalability and integrability of this technology. Here we present the first experimental demonstration of a waveguide-integrated DLA, designed using a photonic inverse design approach. These on-chip devices accelerate sub-relativistic electrons of initial energy 83.4 keV by 1.21 keV over 30 um, providing peak acceleration gradients of 40.3 MeV/m. This progress represents a significant step towards a completely integrated MeV-scale dielectric laser accelerator.

preprint2016arXiv

Elements of a dielectric laser accelerator

The widespread use of high energy particle beams in basic research, medicine and coherent X-ray generation coupled with the large size of modern radio frequency (RF) accelerator devices and facilities has motivated a strong need for alternative accelerators operating in regimes outside of RF. Working at optical frequencies, dielectric laser accelerators (DLAs) - transparent laser-driven nanoscale dielectric structures whose near fields can synchronously accelerate charged particles - have demonstrated high-gradient acceleration with a variety of laser wavelengths, materials, and electron beam parameters, potentially enabling miniaturized accelerators and table-top coherent x-ray sources. To realize a useful (i.e. scalable) DLA, crucial developments have remained: concatenation of components including sustained phase synchronicity to reach arbitrary final energies as well as deflection and focusing elements to keep the beam well collimated along the design axis. Here, all of these elements are demonstrated with a subrelativistic electron beam. In particular, by creating two interaction regions via illumination of a nanograting with two spatio-temporally separated pulsed laser beams, we demonstrate a phase-controlled doubling of electron energy gain from 0.7 to 1.4 keV (2.5 percent to 5 percent of the initial beam energy) and through use of a chirped grating geometry, we overcome the dephasing limit of 25 keV electrons, increasing their energy gains to a laser power limited 10 percent of their initial energy. Further, optically-driven transverse focusing of the electron beam with focal lengths below 200 microns is achieved via a parabolic grating geometry. These results lay the cornerstone for future miniaturized phase synchronous vacuum-structure-based accelerators.

preprint2016arXiv

Transverse and longitudinal characterization of electron beams using interaction with optical near-fields

We demonstrate an experimental technique for both transverse and longitudinal characterization of bunched femtosecond free electron beams. The operation principle is based on monitoring of the current of electrons that obtained an energy gain during the interaction with the synchronized optical near-field wave excited by femtosecond laser pulses. The synchronous accelerating/decelerating fields confined to the surface of a silicon nanostructure are characterized using a highly focused sub-relativistic electron beam. Here the transverse spatial resolution of 450 nm and femtosecond temporal resolution achievable by this technique are demonstrated.

preprint2014arXiv

Laser Acceleration and Deflection of 96.3 keV Electrons with a Silicon Dielectric Structure

Radio frequency particle accelerators are ubiquitous in ultra-small and ultrafast science, but their size and cost has prompted exploration of compact and scalable alternatives like the dielectric laser accelerator. We present the first demonstration of high gradient laser acceleration and deflection of electrons with a silicon structure. Driven by a five nanojoule, 130 fs mode-locked Ti:Sapphire laser at 907 nm wavelength, our devices achieve accelerating gradients in excess of 200 MeV/m and sub-optical cycle streaking of 96.30 keV electrons. These results pave the way for high gradient silicon dielectric laser accelerators using commercial lasers and sub-femtosecond electron beam experiments.