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Ivan Gordon

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Published work

5 published item(s)

preprint2015arXiv

Influence of Periodic Surface Nanopatterning Profiles on Series Resistance in Thin-Film Crystalline Silicon Heterojunction Solar Cells

In the frame of the development of thin crystalline silicon solar cell technologies, surface nanopatterning of silicon is gaining importance. Its impact on the material quality is, however, not yet fully controlled.We investigate here the influence of surface nanotexturing on the series resistance of a contacting scheme relevant for thin-film crystalline silicon heterojunction solar cells. Two dimensional periodic nanotextures are fabricated using a combination of nanoimprint lithography and either dry or wet etching, while random pyramid texturing is used for benchmarking. We compare these texturing techniques in terms of their effect on the series resistance of a solar cell through a study of the sheet resistance (Rsh ) and contact resistance (Rc) of its front layers, i.e., a sputtered transparent conductive oxide and evaporated metal contacts. We have found by four-point probe and the transfer length methods that dry-etched nanopatterns render the highest Rsh and Rc values. Wet-etched nanopatterns, on the other hand, have less impact on Rc and render Rsh similar to that obtained from the nontextured case.

preprint2015arXiv

Integration of a 2D Periodic Nanopattern Into Thin Film Polycrystalline Silicon Solar Cells by Nanoimprint Lithography

The integration of two-dimensional (2D) periodic nanopattern defined by nanoimprint lithography and dry etching into aluminum induced crystallization (AIC) based polycrystalline silicon (Poly-Si) thin film solar cells is investigated experimentally. Compared to the unpatterned cell an increase of 6% in the light absorption has been achieved thanks to the nanopattern which, in turn, increased the short circuit current from 20.6 mA/cm2 to 23.8 mA/cm2. The efficiency, on the other hand, has limitedly increased from 6.4% to 6.7%. We show using the transfer length method (TLM) that the surface topography modification caused by the nanopattern has increased the sheet resistance of the antireflection coating (ARC) layer as well as the contact resistance between the ARC layer and the emitter front contacts. This, in turn, resulted in increased series resistance of the nanopatterned cell which has translated into a decreased fill factor, explaining the limited increase in efficiency.

preprint2013arXiv

Broadband absorption enhancement in ultra-thin crystalline Si solar cells by incorporating metallic and dielectric nanostructures in the back reflector

We propose a back-reflecting scheme in order to enhance the maximum achievable current in one micron thick crystalline silicon solar cells. We perform 3-dimensional numerical investigations of the scattering properties of metallic nanostructures located at the back side, and optimize them for enhancing absorption in the silicon layer. We validate our numerical results experimentally and also compare the absorption enhancement in the solar cell structure, both with quasi-periodic and random metallic nanostructures. We have looked at the interplay between the metallic nanostructures and an integrated back-reflector. We show that the combination of metallic nanoparticles and a metallic reflector results in significant parasitic absorption. We compared this to another implementation based on titanium dioxide nanoparticles which act as a lambertian reflector of light. Our simulation and experimental results show that this proposed configuration results in reduced absorption losses and in broadband enhancement of absorption for ultra-thin solar cells, paving the way to an optimal back reflector for thin film photovoltaics.

preprint2013arXiv

Inverted random nanopyramids patterning for crystalline silicon photovoltaics

We demonstrate a nanopatterning technique for silicon photovoltaics, which optically outperforms conventional micron-scale random pyramids, while decreasing by a factor of ten the quantity of silicon lost during the texturing process. We combine hole-mask colloidal lithography, a bottom-up nanolithography technique, with reactive ion etching to define nanopyramids at the surface of a silicon wafer. Thanks to the self-organised aspect of the technique, the beads are randomly distributed, however keeping a interbead distance of the order of their diameter. We tune the nanopattern feature size to maximize the absorption in the crystalline silicon by exploiting both anti-reflection and light trapping. When optimized, the nanopyramids lead to a higher absorption in the crystalline silicon than the conventional micron-scale random pyramids in the visible and near the band edge, with a superior robustness to variations of the angle of the incident light. As the nanopatterning technique presented here is simple, we expect that it could be readily integrated into the crystalline silicon solar cell fabrication processing.

preprint2012arXiv

Photonic assisted light trapping integrated in ultrathin crystalline silicon solar cells by nanoimprint lithography

We report on the fabrication of two-dimensional periodic photonic nanostructures by nanoimprint lithography and dry etching, and their integration into a 1-μm-thin mono-crystalline silicon solar cell. Thanks to the periodic nanopatterning, a better in-coupling and trapping of light is achieved, resulting in an absorption enhancement. The proposed light trapping mechanism can be explained as the superposition of a graded index effect and of the diffraction of light inside the photoactive layer. The absorption enhancement is translated into a 23% increase in short-circuit current, as compared to the benchmark cell, resulting in an increase in energy-conversion efficiency.