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Ioannis Papakonstantinou

Ioannis Papakonstantinou contributes to research discovery and scholarly infrastructure.

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Published work

3 published item(s)

preprint2022arXiv

Micro-cone arrays enhance outcoupling efficiency in horticulture luminescent solar concentrators

Luminescent solar concentrators (LSCs) have shown the ability to realize spectral conversion, which could tailor solar spectrum to better match photosynthesis requirements. However, conventional LSCs are designed to trap, rather than extract, spectrally converted light. Here, we propose an effective method for improving outcoupling efficiency, based on protruded and extruded micro-cone arrays patterned on the bottom surface of LSCs. Using Monte-Carlo ray tracing, we estimate a maximum external quantum efficiency (EQE) of 37.73% for our Horticulture-LSC (HLSC), corresponding to 53.78% improvement relatively to conventional, planar LSCs. Additionally, structured HLSCs provide diffuse light, beneficial for plant growth. Our micro-patterned surfaces provide a solution to light trapping in LSCs and a foundation for practical application of HLSC.

preprint2021arXiv

A route to engineered high aspect-ratio silicon nanostructures through regenerative secondary mask lithography

Silicon nanostructuring imparts unique material properties including antireflectivity, antifogging, anti-icing, self-cleaning, and/or antimicrobial activity. To tune these properties however, a good control over features size and shape is essential. Here, a versatile fabrication process is presented to achieve tailored silicon nanostructures (thin/thick pillars, sharp/truncated/re-entrant cones), of pitch down to ~50 nm, and high-aspect ratio (>10). The approach relies on pre-assembled block copolymer (BCP) micelles and their direct transfer into a glass hard mask of an arbitrary thickness, now enabled by our recently reported regenerative secondary mask lithography. During this pattern transfer, not only the mask diameter can be decreased but also uniquely increased; constituting the first method to achieve such tunability without necessitating a different molecular weight BCP. Consequently, the hard mask modulation (height, diameter) advances the flexibility in attainable inter-pillar spacing, aspect ratios, and re-entrant profiles (= glass on silicon). Combined with adjusted silicon etch conditions, the morphology of nanopatterns can be highly customized. The process control and scalability enable uniform patterning of a 6-inch wafer which is verified through cross-wafer excellent antireflectivity (<5%) and water-repellency (advancing contact angle 158°; hysteresis 1°). It is envisioned the implementation of this approach to silicon nanostructuring to be far-reaching, facilitating fundamental studies and targeting applications spanning solar panels, antifogging/antibacterial surfaces, sensing, amongst many others.

preprint2020arXiv

Robust Q-tunable topological induced transparency in metasurface

In this study, we demonstrate first, to the best of our knowledge, robust and dynamically polarization-controlled tunable-high-Q PIT in designed nanostructures metasurface, whose sharp resonance is guaranteed by design and protected against large geometrical imperfections. By employing the explicit analysis of near-field characteristic in the reciprocal-space based on the momentum matching, and the far-field radiation features with point-scattering approach in real-space sparked from Huygens&#39;s principles, the physics of interference resonance in the spectra for plane-wave optical transmission and reflection of the metasurface is theoretically and thoroughly investigated. The experimental results verify the theory prediction. The distinctive polarization-selective and Q-tunable PIT shows robust features to performance degradations in traditional PIT system caused by inadvertent fabrication flaws or geometry asymmetry-variations, which paves way for the development of reconfigurable and flexible metasurface and, additionally, opens new avenues in robust and multifunctional nanophotonics device design and applications.