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Huanglong Li

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Published work

6 published item(s)

preprint2023arXiv

A mempolar transistor made from tellurium

The classic three-terminal electronic transistors and the emerging two-terminal ion-based memristors are complementary to each other in various nonconventional information processing systems in a heterogeneous integration approach, such as hybrid CMOS/memristive neuromorphic crossbar arrays. Recent attempts to introduce transitive functions into memristors have given rise to gate-tunable memristive functions, hetero-plasticity and mixed-plasticity functions. However, it remains elusive under what application scenarios and in what ways transistors can benefit from the incorporation of ion-based memristive effects. Here, we introduce a new type of transistor named 'mempolar transistor' to the transistor family. Its polarity can be converted reversibly, in a nonvolatile fashion, between n-type and p-type depending on the history of the applied electrical stimulus. This is achieved by the use of the emerging semiconducting tellurium as the electrochemically active source/drain contact material, in combination with monolayer two-dimensional MoS2 channel, which results in a gated lateral Te/MoS2/Te memristor, or from a different perspective, a transistor whose channel can be converted reversibly between n-type MoS2 and p-type Te. With this unique mempolar function, our transistor holds the promise for reconfigurable logic circuits and secure circuits. In addition, we propose and demonstrate experimentally, a ternary content-addressable memory made of only two mempolar transistors, which used to require a dozen normal transistors, and by simulations, a device-inspired and hardware matched regularization method 'FlipWeight' for training artificial neural networks, which can achieve comparable performance to that achieved by the prevalent 'Dropout' and 'DropConnect' methods. This work represents a major advance in diversifying the functionality of transistors.

preprint2021arXiv

Ferroelectric-HfO2/Oxide Interfaces, Oxygen Distribution Effect and Implications for Device Performance

Atomic-scale understanding of HfO2 ferroelectricity is important to help address many challenges in developing reliable and high-performance ferroelectric HfO2 (fe-HfO2) based devices. Though investigated from different angles, a factor that is real device-relevant and clearly deserves more attention has largely been overlooked by previous research, namely, the fe-HfO2/dielectric interface. Here, we investigate the electronic structures of several typical interfaces formed between ultrathin fe-HfO2 and oxide dielectrics in the sub-3-nm region. We find that interface formation introduces strong depolarizing fields in fe-HfO2, which is detrimental for ferroelectric polarization but can be a merit if tamed for tunneling devices, as recently demonstrated. Asymmetric oxygen distribution-induced polarity, intertwined with ferroelectric polarization or not, is also investigated as a relevant interfacial effect in real device. Though considered detrimental from certain aspects, such as inducing build-in field (independent of ferroelectric polarization) and exacerbating depolarization (intertwined with ferroelectric polarization), it can be partly balanced out by other effects, such as annealing (extrinsic) and polarity-induced defect formation (intrinsic). This work provides insights into ferroelectric-HfO2/dielectric interfaces and some useful implications for the development of devices.

preprint2021arXiv

Internal reverse-biased p-n junctions: a possible origin of the high resistance in phase change superlattice

Phase change superlattice is one of the emerging material technologies for ultralow-power phase change memories. However, the resistance switching mechanism of phase change superlattice is still hotly debated. Early electrical measurements and recent materials characterizations have suggested that the Kooi phase is very likely to be the as-fabricated low-resistance state. Due to the difficulty in in-situ characterization at atomic resolution, the structure of the electrically switched superlattice in its high-resistance state is still unknown and mainly investigated by theoretical modellings. So far, there has been no simple model that can unify experimental results obtained from device-level electrical measurements and atomic-level materials characterizations. In this work, we carry out atomistic transport modellings of the phase change superlattice device and propose a simple mechanism accounting for its high resistance. The modeled high-resistance state is based on the interfacial phase changed superlattice that has previously been mistaken for the low-resistance state. This work advances the understanding of phase change superlattice for emerging memory applications.

preprint2015arXiv

Single neutral substitutional 3d-transition metal in GeTe and GeSb2Te4 by the screened exchange functional

Fe doped GST has shown experimentally the ability to alter its magnetic properties by phase change. In this work, we use screened exchange hybrid functional to study the single neutral substitutional 3d transition metal (TM) in crystalline GeTe and GeSb2Te4. By curing the problem of local density functional (LDA) such as over delocalization of the 3d states, we find that Fe on Ge/Sb site has its majority d states fully occupied while its minority d states are empty, which is different than previous predicted electronic configuration by LDA. From early transition metal Cr to heavier Ni, the majority 3d states are gradually populated until fully occupied and then the minority 3d states begin to be filled. In order to study the magnetic contrast, we use lower symmetry crystalline GeTe and GeSb2Te4 as the amorphous phases, respectively, which has been proposed to model the medium range disordering. We find that only Co substitution in r-GeSb2Te4 and s-GeSb2Te4 shows magnetic contrast. The experimental magnetic contrast for Fe doped GST may be due to additional TM-TM interaction, which is not included in our model. It can also be possible that these lower symmetry crystalline models are not sufficient to characterize the magnetic properties of real 3d TM doped amorphous GST.

preprint2015arXiv

The electronic structures of TiO2/Ti4O7, Ta2O5/TaO2 interfaces and the interfacial effects of dopants

We study the electronic structures of TiO2/Ti4O7 and Ta2O5/TaO2 interfaces using the screened exchange (sX-LDA) functional. Both of these bilayer structures are useful infrastructures for high performance RRAMs. We find that the system Fermi energies of both interfaces are just above the conduction band edge of the corresponding stoichiometric oxides. According to the charge transition levels of the oxygen vacancies in Ta2O5 and TiO2, the oxygen vacancies are stabilized at the -2 charged state. We propose to introduce interfacial dopants to shift the system Fermi energies downward so that the +2 charged oxygen vacancy can be stable, which is important for the controlled switching under the electrical field. Several dipole models are presented to account for the ability of Fermi level shift due to the interfacial dopants.

preprint2015arXiv

The role of single oxygen or metal induced defect and correlated multiple defects in the formation of conducting filaments

We study the dependence of the formation energies of oxygen and metal induced defects in Ta2O5, TaO2, TaO, TiO2 and Ti4O7 on the chemical potential of electron and atomic constitutes. In the study of single defect, metal induced defects are found to be preferable to oxygen induced defects. This is against the experimental fact of the dominant role of oxygen induced defects in the RS process. A simple multiple defects picture without correlated atomic rearrangement does not cure this problem. The problem is resolved under the correlated multiple defect picture where the multiple defects result in correlated atomic rearrangement and the final products show certain atomic ordering.