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Hanfei Yan

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Published work

4 published item(s)

preprint2020arXiv

Complete Strain Mapping of Nanosheets of Tantalum Disulfide

Quasi-two-dimensional (quasi-2D) materials hold promise for future electronics because of their unique band structures that result in electronic and mechanical properties sensitive to crystal strains in all three dimensions. Quantifying crystal strain is a prerequisite to correlating it with the performance of the device, and calls for high resolution but spatially resolved rapid characterization methods. Here we show that using fly-scan nano X-ray diffraction we can accomplish a tensile strain sensitivity below 0.001% with a spatial resolution of better than 80 nm over a spatial extent of 100 $μ$m on quasi 2D flakes of 1T-TaS2. Coherent diffraction patterns were collected from a $\sim$ 100 nm thick sheet of 1T-TaS2 by scanning 12keV focused X-ray beam across and rotating the sample. We demonstrate that the strain distribution around micron and sub-micron sized 'bubbles' that are present in the sample may be reconstructed from these images. The experiments use state of the art synchrotron instrumentation, and will allow rapid and non-intrusive strain mapping of thin film samples and electronic devices based on quasi 2D materials.

preprint2020arXiv

Ptychographic X-ray Speckle Tracking with Multi Layer Laue Lens Systems

The ever-increasing brightness of synchrotron radiation sources demands improved x-ray optics to utilise their capability for imaging and probing biological cells, nano-devices, and functional matter on the nanometre scale with chemical sensitivity. Hard x-rays are ideal for high-resolution imaging and spectroscopic applications due to their short wavelength, high penetrating power, and chemical sensitivity. The penetrating power that makes x-rays useful for imaging also makes focusing them technologically challenging. Recent developments in layer deposition techniques that have enabled the fabrication of a series of highly focusing x-ray lenses, known as wedged multi layer Laue lenses. Improvements to the lens design and fabrication technique demands an accurate, robust, in-situ and at-wavelength characterisation method. To this end, we have developed a modified form of the speckle-tracking wavefront metrology method, the ptychographic x-ray speckle tracking method, which is capable of operating with highly divergent wavefields. A useful by-product of this method, is that it also provides high-resolution and aberration-free projection images of extended specimens. We report on three separate experiments using this method, where we have resolved ray path angles to within 4 nano-radians with an imaging resolution of 45nm (full-period). This method does not require a high degree of coherence, making it suitable for lab based x-ray sources. Likewise it is robust to errors in the registered sample positions making it suitable for x-ray free-electron laser facilities, where beam pointing fluctuations can be problematic for wavefront metrology.

preprint2019arXiv

Ptychographic phase-retrieval by proximal algorithms

We derive a set of ptychography phase-retrieval iterative engines based on proximal algorithms originally developed in convex optimization theory, and discuss their connections with existing ones. The use of proximal operator creates a simple frame work that allows us to incorporate the effect of noise from a maximum-likelihood principle. We focus on three particular algorithms, namely proximal minimization, alternating direction method of multiplier and accelerated proximal gradient, and benckmark their performance with numerical simulations and experimental x-ray data. Among them, accelerated proximal gradient shows superior performance in terms of both accuracy and convergence rate for a noisy dataset.

preprint2014arXiv

Ion beam lithography for Fresnel zone plates in X-ray microscopy

Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL). Here, we show that ion beam lithography (IBL) may advantageously simplify their preparation. A FZP operable from the extreme UV to the limit of the hard X-ray was prepared and tested from 450 eV to 1500 eV. The trapezoidal profile of the FZP favorably activates its 2nd order focus. The FZP with an outermost zone width of 100 nm allows the visualization of features down to 61, 31 and 21 nm in the 1st, 2nd and 3rd order focus respectively. Measured efficiencies in the 1st and 2nd order of diffraction reach the theoretical predictions.