Atomic Layer Deposition of SiO-GeO multilayers
Despite its interest for CMOS applications, Atomic Layer Deposition (ALD) of GeO thin films, by itself or in combination with SiO, has not been widely investigated yet. Here we report the ALD growth of SiO/GeO multilayers on Silicon substrates using a so far unreported Ge precursor. The characterization of multilayers with various periodicities reveals successful layer-by-layer growth with electron density contrast and absence of chemical intermixing, down to a periodicity of 2 atomic layers.