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Researcher profile

Gabriele Seguini

Gabriele Seguini contributes to research discovery and scholarly infrastructure.

ResearcherAffiliation not importedOpen to collaborate
cond-mat.mtrl-scicond-mat.soft

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Published work

4 published item(s)

preprint2026arXiv

Thermodynamic and ordering kinetics in asymmetric PS-b-PMMA block copolymer thin films

The ordering kinetics of standing cylinder-forming polystyrene-block-poly (methyl methacrylate) block copolymers (molecular weight: 39 kg/mol) close to the order-disorder transition is experimentally investigated following the temporal evolution of the correlation length at different annealing temperatures. The grow exponent of the grain coarsening process is determined to be 1/2, signature of a curvature driven ordering mechanism. The measured activation enthalpy and the resulting Meyer-Neldel temperature for this specific copolymer along with the data already known for PS-b-PMMA block copolymers in strong segregation limit, allows investigating the interplay between the ordering kinetics and the thermodynamic driving force during the grain coarsening. These findings unveil various phenomena concomitantly occurring during the thermally activated ordering kinetics at segmental, single chain, and collective level.

0 citations0 reviewsNo code linkedOpen access
preprint2020arXiv

Effect of the Density of Reactive Sites in P(S-r-MMA) Film During Al2O3 Growth by Sequential Infiltration Synthesis

Sequential infiltration synthesis (SIS) consists in a controlled sequence of metal organic precursors and co-reactant vapor exposure cycles of polymer films. Two aspects characterize a SIS process: precursor molecule diffusion within the polymer matrix and precursor molecule entrapment into polymer films via chemical reaction. In this paper, we investigated SIS process for the alumina synthesis using trimethylaluminum (TMA) and H2O in thin films of poly(styrene-random-methyl methacrylate) (P(S-r-MMA)) with variable MMA content. The amount of alumina grown in the P(S-r-MMA) films linearly depends on MMA content. A relatively low concentration of MMA in the copolymer matrix is enough to guarantee the volumetric growth of alumina in the polymer film. In pure polystyrene, metal oxide seeds grow in the sub-surface region of the film. In-situ dynamic spectroscopic ellipsometry (SE) analyses provide quantitative information about TMA diffusivity in pristine P(S-r-MMA) matrices as a function of MMA fraction, allowing further insight into the process kinetics as a function of the density of reactive sites in the polymer film. This work improves the understanding of infiltration synthesis mechanism and provides a practical approach to potentially expand the library of polymers that can be effectively infiltrated by introducing reactive sites in the polymer chain.

0 citations0 reviewsNo code linkedOpen access
preprint2020arXiv

Ozone-based sequential infiltration synthesis of Al2O3 nanostructures in symmetric block copolymer

Sequential infiltration synthesis (SIS) provides an original strategy to grow inorganic materials by infiltrating gaseous precursors in polymeric films. Combined with micro-phase separated nanostructures resulting from block copoly-mer (BCP) self-assembly, SIS selectively binds the precursors to only one domain mimicking the morphology of the original BCP template. This methodology represents a smart solution for the fabrication of inorganic nanostructures starting from self-assembled BCP thin films, in view of advanced lithographic application and of functional nanostructure synthesis. The SIS process using Trimethylaluminum (TMA) and H2O precursors in self-assembled PS-b-PMMA BCP thin films established as a model system, where the PMMA phase is selectively infiltrated. However the temperature range allowed by polymeric material restricts the available precursors to highly reactive reagents, such as TMA. In order to extend the SIS methodology and access a wide library of materials, a crucial step is the implementation of processes using reactive reagents that are fully compatible with the initial polymeric template. This work reports a comprehensive morphological (SEM, SE, AFM) and physico-chemical (XPS) investigation of alumina nanostructures synthesized by means of a SIS process using O3 as oxygen precursor in self-assembled PS-b-PMMA thin films with lamellar morphology. The comparison with the H2O-based SIS pro-cess validates the possibility to use O3 as oxygen precursor expanding the possible range of precursors for the fabrication of inorganic nanostructures.

0 citations0 reviewsNo code linkedOpen access
preprint2020arXiv

Trimethylaluminum Diffusion in PMMA Thin Films during Sequential Infiltration Synthesis: In Situ Dynamic Spectroscopic Ellipsometric Investigation

Sequential infiltration synthesis (SIS) provides a successful route to grow inorganic materials into polymeric films by penetrating of gaseous precursors into the polymer, both in order to enhance the functional properties of the polymer creating an organic-inorganic hybrid material, and to fabricate inorganic nanostructures when infiltrating in patterned polymer films or in selfassembled block copolymers. A SIS process consists in a controlled sequence of metal organic precursor and co-reactant vapor exposure cycles of the polymer films in an atomic layer deposition (ALD) reactor. In this work, we present a study of the SIS process of alumina using trimethylaluminum (TMA) and H2O in various polymer films using in situ dynamic spectroscopic ellipsometry (SE). In situ dynamic SE enables time-resolved monitoring of the swelling of the polymer, which is relevant to the diffusion and retain of the metal precursor into the polymer itself. Different swelling behaviour of poly(methylmethacrylate) (PMMA) and polystyrene (PS) was observed when exposed to TMA vapor. PMMA films swell more significantly than PS films do, resulting in very different infiltrated Al2O3 thickness after polymer removal in O2 plasma. PMMA films reach different swollen states upon TMA exposure and reaction with H2O, depending on the TMA dose and on the purge duration after TMA exposure, which correspond to different amounts of metal precursor retained inside the polymer and converted to alumina. Diffusion coefficients of TMA in PMMA were extracted investigating the swelling of pristine PMMA films during TMA infiltration and shown to be dependent on polymer molecular weight. In situ dynamic SE monitoring allows to control the SIS process tuning it from an ALD-like process for long purge to a chemical vapour deposition - like process selectively confined inside the polymer films

0 citations0 reviewsNo code linkedOpen access