BZPEERReading, trust and collaboration for research
Menu

Discover

GraphFollow connections around a paper, topic or saved view.

Workspaces

HomePick up where your research flow left off.InboxHandle requests, replies and notifications from one place.CollectionsCurate reading lists, evidence sets and shareable dossiers.ResearchSee your private provenance graph, trail and imports.CollaborationMove from discovery into focused discussion rooms.PublishDraft, preview and publish full-text research articles.

Network

ExpertsFind specialists worth following or asking for help.CommunitiesJoin research circles organized around shared work.PartnersSee external organizations active around the same topics.

Opportunities

ListingsBrowse roles, calls and collaborations with clearer fit signals.

Account

Log inReturn to your reading and collaboration workspace.Create accountStart saving work, following people and joining teams.
Log inCreate account

Researcher profile

Filippo Campi

Filippo Campi contributes to research discovery and scholarly infrastructure.

ResearcherAffiliation not importedOpen to collaborate
cond-mat.mtrl-sciphysics.app-phphysics.optics

Trust snapshot

Quick read

Trust 13 - UnverifiedVerification L1Unclaimed author
2works
0followers
3topics
4close collaborators

Actions

Decide how to stay connected

Follow researcher0

Identity and collaboration

How to connect with this researcher

Claiming links this public author record to a researcher profile and unlocks direct collaboration workflows.

Log in to claim

Direct collaboration

Open a focused conversation when the fit is right

Claim this author entity first to unlock direct invitations.

Research graph

See the researcher in context

Open full explorer

Inspect adjacent work, topics, institutions and collaborators without jumping out to a separate graph page.

Building this graph slice

BZPEER is loading the nearby papers, people, topics and institutions for this page.

Published work

2 published item(s)

preprint2020arXiv

XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy

Inorganic molecular materials such as tin oxo cages are a promising generation of photoresists compatible with the demands of the recently developed Extreme UltraViolet (EUV) lithography technology. Therefore, a detailed understanding of the photon-induced reactions which occur in photoresists after exposure is important. We used XUV broadband laser pulses in the range of 25-40 eV from a table-top high-harmonic source to expose thin films of the tin oxo cage resist to shed light on some of the photo-induced chemistry via XUV absorption spectroscopy. During the exposure, the transmitted spectra were recorded and a noticeable absorbance decrease was observed in the resist. Dill parameters were extracted to quantify the XUV induced conversion and compared to EUV exposure results at 92 eV. Based on the absorption changes, we estimate that approximately 60% of tin-carbon bonds are cleaved at the end of the exposure.

0 citations0 reviewsNo code linkedOpen access
preprint2019arXiv

Divergence control of high-harmonic generation

We show that the divergence of extreme ultraviolet pulses from high harmonic generation, which is directly linked to the shape and size of the refocused beam, can be controlled by the relative delay between the fundamental and its intense orthogonally polarized second harmonic in two-color high-harmonic generation. We find that the divergence is minimized close to the delays were the number of emitted photons is maximized. These findings are rationalized as suppression and enhancement of long and short electron trajectories as function of the phase of the two-color laser field, respectively. The orthogonally polarized second harmonic introduces a lateral momentum component that can select one trajectory whereas it deflects the other. At the same time, the second harmonic profoundly influences the tunnel ionization process that initiates high-harmonic generation, which provides another trajectory gate. Our scheme for controlling the divergence facilitates larger numerical apertures for extreme ultraviolet microscopy. In addition, the associated reduction of the size of the focus is beneficial for extreme ultraviolet nonlinear optics and spectroscopy, as well as imaging and metrology of embedded structures.

0 citations0 reviewsNo code linkedOpen access