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F. Biccari

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Published work

2 published item(s)

preprint2020arXiv

N-nH complexes in GaAs studied at the atomic scale by cross-sectional scanning tunneling microscopy

Hydrogenation of nitrogen (N) doped GaAs allows for reversible tuning of the bandgap and the creation of site controlled quantum dots through the manipulation of N-nH complexes, N-nH complexes, wherein a nitrogen atom is surrounded by n hydrogen (H) atoms. Here we employ cross-sectional scanning tunneling microscopy (X-STM) to study these complexes in the GaAs (110) surface at the atomic scale. In addition to that we performed density functional theory (DFT) calculations to determine the atomic properties of the N-nH complexes. We argue that at or near the (110) GaAs surface two H atoms from N-nH complexes dissociate as an H$_2$ molecule. We observe multiple features related to the hydrogenation process, of which a subset is classified as N-1H complexes. These N-1H related features show an apparent reduction of the local density of states (LDOS), characteristic to N atoms in the GaAs (110) surface with an additional apparent localized enhancement of the LDOS located in one of three crystal directions. N-nH features can be manipulated with the STM tip. Showing in one case a switching behavior between two mirror-symmetric states and in another case a removal of the localized enhancement of the LDOS. The disappearance of the bright contrast is most likely a signature of the removal of an H atom from the N-nH complex.

preprint2013arXiv

Impurity effects in Cu$_2$O

The doping of wide gap semiconductors is an interesting problem both from the scientific and technological point of view. A well known example of this problem is the doping of Cu$_2$O. The only element which has produced an order of magnitude increase in the conductivity of Cu$_2$O bulk samples is chlorine, as previously reported by us and others. However the solar cells produced with this material do not show any improvement in performances because of the reduction in the minority carrier diffusion length. In this paper we investigate the effect of other impurities in order to check their possible use as dopants and to assess their effects on the minority carrier diffusion length. Seven impurities have been introduced by evaporation on the starting copper sheet before the oxidation used to produce Cu$_2$O: chromium (Cr), iron (Fe), silver (Ag), silicon (Si), sodium (Na), sulfur (S) and phosphorus (P). The experiments show that a 20 ppm of concentration of these dopants does not give any relevant effect neither on the resistivity, nor on the mobility. The effect on minority carrier diffusion length is also negligible except for sodium which produces a slight degradation of the samples.