Researcher profile

E. I. Meletis

E. I. Meletis contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2020arXiv

Extreme High-Field Superconductivity in Thin Re Films

We report the high-field superconducting properties of thin, disordered Re films via magneto-transport and tunneling density of states measurements. Films with thicknesses in the range of 9 nm to 3 nm had normal state sheet resistances of $\sim$0.2 k$Ω$ to $\sim$1 k$Ω$ and corresponding transition temperatures in the range of 6 K to 3 K. Tunneling spectra were consistent with those of a moderate coupling BCS superconductor. Notwithstanding these unremarkable superconducting properties, the films exhibited an extraordinarily high upper critical field. We estimate their zero-temperature $H_{c2}$ to be more than twice the Pauli limit. Indeed, in 6 nm samples the estimated reduced critical field $H_{c2}/T_c\sim$ 5.6 T/K is among the highest reported for any elemental superconductor. Although the sheet resistances of the films were well below the quantum resistance $R_Q=h/4e^2$, their $H_{c2}$'s approached the theoretical upper limit of a strongly disordered superconductor for which $k_F\ell\sim1$.

preprint2020arXiv

High temperature mechanical properties and microstructure of hard TaSiN coatings

Room and high temperature mechanical properties of reactive magnetron sputtered TaSiN coatings were measured using nanoindentation (between 25C and 500C). Fracture toughness was also evaluated at a similar temperature range using the micropillar splitting method. The influence of the nitrogen concentration on the evolving phases and microstructure of the TaSiN coatings, before and after the high temperature testing, were examined by X-ray diffraction (XRD) and transmission electron microscopy (TEM) analysis. XRD spectra showed broad peaks with hexagonal $γ$-Ta2N as the main phase, with the cubic $δ$-TaN phase emerging for higher N contents. Phase composition remained unchanged before and after the 500C tests. However, after the high temperature tests, TEM analysis showed the presence of an oxide surface layer, with a thickness that decreased (from 42 to 15 nm) with N content, due to residual oxygen diffusion, which replaces nitrogen to form amorphous SiOx. Beneath the oxide-rich surface layer, coatings exhibited a stable nanocrystalline columnar microstructure. Hardness and fracture toughness increased with N content, initially due to the formation of an amorphous Si-N tissue at grain boundaries, and for even higher N contents, due to the appearance of the hard cubic $δ$-TaN phase. Hardness at 500C decreased only by 15%, while fracture toughness followed the opposite trend, due to increased plasticity with temperature. The optimum composition turned out to be Ta55Si10N35, which retained a hardness of 30 GPa at 500C, being also the toughest. These observations make this system very interesting for high temperature applications.