Source author record

Dhwanil Patel

Dhwanil Patel appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record

Catalog footprint

What is connected

1works
1topics
4close collaborators

Actions

Connect this record

Log in to claim

Research graph

See the researcher in context

Open full explorer

Inspect adjacent papers, topics, institutions and collaborators without losing the researcher page.

Building this map preview

BZPEER is loading the nearby papers, people, topics and institutions for this page.

Published work

1 published item(s)

preprint2026arXiv

Design of efficient high-order immersed metagratings using an evolutionary algorithm

Immersed reflection gratings improve spectral resolving power by enabling diffraction within a high refractive index medium. This principle has been widely adopted to make grating spectrometers more compact. Conventional immersed gratings have blazed profiles which typically show the highest efficiency for one main design wavelength. In addition, the blazed profiles tend to cause significant polarization sensitivity. In this work, we propose an alternative approach for designing an immersed grating composed of sub-wavelength structures, designed to increase diffraction efficiency and reduce polarization dependence. For a theoretical demonstration, a reflective metagrating immersed in silicon is optimized over the short-wave infrared band-3 (SWIR-3, here $2.304~μ$m-$2.405~μ$m), targeting the same diffraction angles as the immersion grating used in the Sentinel-5 Earth observation mission. The structure is optimized using a modified Covariance Matrix Adaptation Evolution Strategy (CMA-ES). The optimized immersed metagrating achieves an average efficiency of (over the SWIR-3 band) $\sim 78\%$, compared to $\sim 62\%$ for the conventional immersed blazed grating, and reduces polarization sensitivity from roughly $\sim 15\%$ to $\sim 5\%$. A manufacturing tolerance analysis is also conducted to evaluate the design's performance under systematic manufacturing errors, which revealed a degradation of $\sim 10\%$ efficiency at feature size errors of $\pm 25{nm}$ and almost negligible effect on the efficiency at $-10{nm}$ and of $\sim 5\%$ at $+10{nm}$.