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David Esseni

David Esseni contributes to research discovery and scholarly infrastructure.

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Published work

3 published item(s)

preprint2022arXiv

Limitations to Electrical Probing of Spontaneous Polarization in Ferroelectric-Dielectric Heterostructures

An accurate estimate of the ferroelectric polarization in ferroelectric-dielectric stacks is important from a materials science perspective, and it is also crucial for the development of ferroelectric based electron devices. This paper revisits the theory and application of the PUND technique in Metal-Ferroelectric-Dielectric-Metal (MFDM) structures by using analytical derivations and numerical simulations. In an MFDM structure the results of the PUND technique may largely differ from the polarization actually switched in the stack, which in turn is different from the remnant polarization of the underlying ferroelectric. The main hindrances that prevent PUND measurements from providing a good estimate of the polarization switching in MFDM stacks are thus discussed. The inspection of the involved physical quantities, not always accessible in experiments, provides a useful insight about the main sources of the errors in the PUND technique, and clarifies the delicate interplay between the depolarization field and the charge injection and trapping in MFDM stacks with a thin dielectric layer.

preprint2022arXiv

Operation and Design of Ferroelectric FETs for a BEOL Compatible Device Implementation

We present a study based on numerical simulations and comparative analysis of recent experimental data concerning the operation and design of FeFETs. Our results show that a proper consideration of charge trapping in the ferroelectric-dielectric stack is indispensable to reconcile simulations with experiments, and to attain the desired hysteretic behavior of the current-voltage characteristics. Then we analyze a few design options for polysilicon channel FeFETs and, in particular, we study the influence of the channel thickness and doping concentration on the memory window, and on the ratio between the polarization dependent, high and low resistance state.

preprint2013arXiv

Single Particle Transport in Two-dimensional Heterojunction Interlayer Tunneling Field Effect Transistor

The single particle tunneling in a vertical stack consisting of monolayers of two-dimensional semiconductors is studied theoretically and its application to a novel Two-dimensional Heterojunction Interlayer Tunneling Field Effect Transistor (Thin-TFET) is proposed and described. The tunneling current is calculated by using a formalism based on the Bardeen's transfer Hamiltonian, and including a semi-classical treatment of scattering and energy broadening effects. The misalignment between the two 2D materials is also studied and found to influence the magnitude of the tunneling current, but have a modest impact on its gate voltage dependence. Our simulation results suggest that the Thin-TFETs can achieve very steep subthreshold swing, whose lower limit is ultimately set by the band tails in the energy gaps of the 2D materials produced by energy broadening. The Thin-TFET is thus very promising as a low voltage, low energy solid state electronic switch.