Source author record

Christian Maszl

Christian Maszl appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record

Catalog footprint

What is connected

2works
2topics
4close collaborators

Actions

Connect this record

Log in to claim

Research graph

See the researcher in context

Open full explorer

Inspect adjacent papers, topics, institutions and collaborators without losing the researcher page.

Building this map preview

BZPEER is loading the nearby papers, people, topics and institutions for this page.

Published work

2 published item(s)

preprint2015arXiv

Scaling and laws of DC discharges as pointers for HiPIMS plasmas

Scaling or smiliarity laws of plasmas are of interest if lab size plasma sources are to be scaled for industrial processes. Ideally, the discharge parameters of the scaled plasmas are predictable and the fundamental physical processes are unaltered. Naturally, there are limitations and ranges of validity. Scaling laws for direct current glow discharges are well known. If a well diagnosed discharge is scaled, the field strength in the positive column, the gas amplification and the normal current density can easily be estimated. For non-stationary high power discharges like high power impulse magnetron sputtering (HiPIMS) plasmas, scaling is not as straight forward. Here, one deals with a non-stationary complex system with strong changes in plasma chemistry and symmetry breaks during the pulses. Because of the huge parameter space no good parameters are available to define these kind of discharges unambiguous at the moment. In this contribution we will discuss the scaling laws for DC glow discharges briefly and present experimental results for a discharge with copper electrodes and helium as plasma forming gas. This discharge was operated in a pressure range from 200 to 1600 hPa with three different electrode diameters (D=2.1, 3.0 and 4.3 mm). Results from breakdown voltage measurements indicate that the pressure and electrode distance cannot be varied independently. Effects of the scaling on the reduced normal current density, the reduced normal electric field in the positive column and discharge temperature will be discussed and limitations highlighted. Compared with these results the added complexity of HiPIMS plasmas will be described. Suggestions in the community how to obtain experimental finger prints of the plasmas will be reviewed and implications from the experiences with DC discharges on the development of similarity laws for HiPIMS plasmas will be discussed.

preprint2013arXiv

Time resolved measurement of film growth during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride

The growth rate during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride is measured with a temporal resolution of up to 25 us using a rotating shutter concept. According to that concept a 200 um slit is rotated in front of the substrate synchronous with the HIPIMS pulses. Thereby, the growth flux is laterally distributed over the substrate. By measuring the resulting deposition profile with profilometry and with x-ray photoelectron spectroscopy, the temporal variation of the titanium and nitrogen growth flux per pulse is deduced. The analysis reveals that film growth occurs mainly during a HIPIMS pulse, with the growth rate following the HIPIMS phases ignition, current rise, gas rarefaction, plateau and afterglow. The growth fluxes of titanium and nitrogen follow slightly different behaviors with titanium dominating at the beginning of the HIPIMS pulse and nitrogen at the end of the pulse. This is explained by the gas rarefaction effect resulting in a dense initial metal plasma and metal films which are subsequently being nitrified.