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Jan Benedikt

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Published work

7 published item(s)

preprint2021arXiv

Multi-diagnostic approach to energy transport in an atmospheric pressure helium-oxygen plasma jet

The energy balance of a plasma holds fundamental information not only about basic plasma physics, but it is also important for tailoring plasmas to specific applications. Especially RF-driven atmospheric pressure plasma jets (APPJs) operated in helium with oxygen admixture have high application potential in industry and medicine. Many types of plasma jets have been studied up to now, leading to the challenge how to compare results from various sources. We have developed a method for measuring the power deposited in the plasma as the parameter to compare different sources and gas mixtures with each other. Furthermore, we studied energy transport as a function of this input power and molecular gas admixture in a newly developed APPJ based on the COST-reference jet with a capillary as a dielectric in between the electrodes. The gas temperature, atomic oxygen density, ozone density and absolute emission intensity in the visible wavelength range have been determined. Combining the results gave an energy balance with most of the energy deposited into gas heating. Production of final chemical products made up a small amount of the deposited power while radiation was negligible for all combinations of external parameters studied.

preprint2013arXiv

Particle beam experiments for the investigation of plasma-surface interactions: application to magnetron sputtering and polymer treatment

A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions. Atom and ion beams are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions and metal vapor. The heterogeneous surface processes are monitored in-situ and in real time by means of a quartz crystal microbalance (QCM) and Fourier transform infrared spectroscopy (FTIR). Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma treatment of polymers (PET, PP).

preprint2013arXiv

Time resolved measurement of film growth during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride

The growth rate during reactive high power pulsed magnetron sputtering (HIPIMS) of titanium nitride is measured with a temporal resolution of up to 25 us using a rotating shutter concept. According to that concept a 200 um slit is rotated in front of the substrate synchronous with the HIPIMS pulses. Thereby, the growth flux is laterally distributed over the substrate. By measuring the resulting deposition profile with profilometry and with x-ray photoelectron spectroscopy, the temporal variation of the titanium and nitrogen growth flux per pulse is deduced. The analysis reveals that film growth occurs mainly during a HIPIMS pulse, with the growth rate following the HIPIMS phases ignition, current rise, gas rarefaction, plateau and afterglow. The growth fluxes of titanium and nitrogen follow slightly different behaviors with titanium dominating at the beginning of the HIPIMS pulse and nitrogen at the end of the pulse. This is explained by the gas rarefaction effect resulting in a dense initial metal plasma and metal films which are subsequently being nitrified.

preprint2011arXiv

Deposition of SiOx films by means of atmospheric pressure microplasma jets

Atmospheric pressure plasma jet sources are currently in the focus of many researchers for their promising applications in medical industry (e.g. treatment of living tissues), surface modification or material etching or synthesis. Here we report on the study of fundamental principles of deposition of SiOx films from microplasma jets with admixture of hexamethyldisiloxane [(CH3)3SiOSi(CH3)3, HMDSO] molecules and oxygen. The properties of the deposited films, the composition of the plasma as measured by molecular beam mass spectrometry and the effect of additional treatment of grown film by oxygen or hydrogen atoms will be presented.

preprint2011arXiv

Diagnostics of low and atmospheric pressure plasmas by means of mass spectrometry

The knowledge of absolute fluxes of reactive species such as radicals or energetic ions to the surface is crucial for understanding the growth or etching of thin films. These species have due to their high reactivity very low densities and their detection is therefore a challenging task. Mass spectrometry is a very sensitive technique and it will be demonstrated that it is a good choice for the study of plasma chemistry. Mass spectrometry measures the plasma composition directly at the surface and is not limited by existence of accessible optical transitions. When properly designed and carefully calibrated mass spectrometry provides absolute densities of the measured species. It can even measure internally excited metastable species. Here, measurement of neutral species and positive ions generated in an atmospheric pressure plasmas jet operated with He, hexamethyldisiloxane and O2 will be presented.

preprint2011arXiv

The mystery of O and O3 production in the effluent of a He/O2 atmospheric pressure microplasma jet

Microplasma jets are commonly used to treat samples in ambient air atmosphere. The effect of admixing air into the effluent may severely affect the composition of the emerging species. Here, the effluent of a He/O2 microplasma jet has been analyzed in a helium and in an air atmosphere by molecular beam mass spectrometry. First, the composition of the effluent in air has been recorded as a function of the distance to determine how fast air admixes into the effluent. Then, the spatial distribution of atomic oxygen and ozone in the effluent has been recorded in ambient air and compared to measurements in a helium atmosphere. Additionally, a fluid model of the gas flow with reaction kinetics of reactive oxygen species in the effluent has been constructed. In ambient air, the O density declines only slightly faster with the distance compared to a helium atmosphere. On the contrary, the O3 density in ambient air increases significantly faster with the distance compared to a helium atmosphere. This mysterious behavior can have big implication for the use of similar jets in plasma medicine. It is shown that photodissociation of O2 and O3 is not responsible for the observed effect. A reaction scheme involving the reaction of plasma produced highly vibrationally excited O2 with ground state O2 molecules is proposed as a possible explanation of the observed densities. A very good agreement between measured and simulated densities is achieved.

preprint2011arXiv

The role of VUV radiation in the inactivation of bacteria with an atmospheric pressure plasma jet

A modified version of a micro scale atmospheric pressure plasma jet (μ-APPJ) source, so-called X-Jet, is used to study the role of plasma generated VUV photons in the inactivation of E. coli bacteria. The plasma is operated in He gas or a He/O2 mixture and the X-Jet modification of the jet geometry allows effective separation of heavy reactive particles (such as O atoms or ozone molecules) from the plasma-generated photons. The measurements of the evolution of zone of inhibitions formed in monolayers of vegetative E. coli bacteria, of VUV emission intensity and of positive ion spectra show that photochemistry in the gas phase followed by photochemistry products impacting on bacteria can result in bacterial inactivation. Interestingly, this process is more effective than direct inactivation by VUV radiation damage. Mainly protonated water cluster ions are detected by mass spectrometry indicating that water impurity has to be carefully considered. The measurements indicate that the combination of the presence of water cluster ions and O2 molecules at the surface leads to the strongest effect. Additionally, it seem that the interaction of VUV photons with effluent of He/O2 plasma leads to enhanced formation of O3, which is not the case when only O2 molecules and gas impurities at room temperature interacts with plasma generated VUV photons.