Researcher profile

Carmen Jimenez

Carmen Jimenez contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2020arXiv

Facile patterning of functional materials via gas-phase 3D printing

Spatial Atomic Layer Deposition (SALD) is a recent approach that is up to two orders of magnitude faster than conventional ALD, and that can be performed at atmospheric pressure and even in the open air. Previous works have exploited these assets to focus on the possibility of high-rate, large-area deposition for scaling up into mass production. Conversely, here we show that SALD indeed represents an ideal platform for the selective deposition of functional materials by proper design and miniaturization of SALD close-proximity heads. In particular, we have used the potential offered by 3D printing to fabricate custom close-proximity SALD injection heads. By using 3D printing, the heads can be easily designed and readily modified to obtain different deposition areas, free-form patterns, and even complex multimaterial structures. The heads can be printed in different materials to adjust to the chemistry of the precursors and the deposition conditions used. Polymeric heads can be used as cheap (even disposable) heads that are both used for performing deposition and for prototyping and optimization purposes. Finally, by designing a miniaturized head with circular concentric gas channels, 3D printing of functional materials can be performed with nanometric resolution in Z. This constitutes a new 3D printing approach based on gaseous precursors. Because the selective deposition strategies presented here are based on the SALD process, conformal and continuous thin films of functional materials can be printed at low temperatures and with high deposition rate in the open air. Our approach represents a new versatile way of printing functional materials and devices with spatial and topological control, thus extending the potential of SALD and ALD in general, and opening a new avenue in the field of area-selective deposition of functional materials.

preprint2011arXiv

Thulium and ytterbium-doped titania thin films deposited by MOCVD

In this study we synthesized thin films of titanium oxide doped with thulium and/or ytterbium to modify the incident spectrum on the solar cells. This could be achieved either by photoluminescence up-converting devices, or down-converting devices. As down-converter thin films our work deals with thulium and ytterbium-doped titanium dioxide. Thulium and ytterbium will act as sensitizer and emitter, respectively. The rare-earth doped thin films are deposited by aerosol-assisted MOCVD using organo-metallic precursors such as titanium dioxide acetylacetonate, thulium and ytterbium tetramethylheptanedionate solved in different solvents. These films have been deposited on silicon substrates under different deposition conditions (temperature and dopant concentrations for example). Adherent films have been obtained for deposition temperatures ranging from 300°C to 600°C. The deposition rate varies from 0.1 to 1 μm/h. The anatase phase is obtained at substrate temperature above 400°C. Further annealing is required to exhibit luminescence and eliminate organic remnants of the precursors. The physicochemical and luminescent properties of the deposited films were analyzed versus the different deposition parameters and annealing conditions. We showed that absorbed light in the near-UV blue range is re-emitted by the ytterbium at 980 nm and by a thulium band around 800 nm.