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Cagil Koroglu

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preprint2022arXiv

Substrate-Dependence of Monolayer MoS2_2 Thermal Conductivity and Thermal Boundary Conductance

The thermal properties of two-dimensional (2D) materials, like MoS2_2, are known to be affected by interactions with their environment, but this has primarily been studied only with SiO2_2 substrates. Here, we compare the thermal conductivity (TC) and thermal boundary conductance (TBC) of monolayer MoS2_2 on amorphous (a-) and crystalline (c-) SiO2_2, AlN, Al2_2O3_3, and h\textit{h}-BN monolayers using molecular dynamics. The room temperature TC of MoS2_2 is ~38 Wm−1^{-1}K−1^{-1} on amorphous substrates and up to ~68 Wm−1^{-1}K−1^{-1} on crystalline substrates, with most of the difference due to substrate interactions with long-wavelength MoS2_2 phonons (< 2 THz). An h\textit{h}-BN monolayer used as a buffer between MoS2_2 and the substrate causes the MoS2_2 TC to increase by up to 50%. Length-dependent calculations reveal TC size effects below ~2 μμm and show that the MoS2_2 TC is size- but not substrate-limited below ~100 nm. We also find that the TBC of MoS2_2 with c-Al2_2O3_3 is over twice that with c-AlN despite a similar MoS2_2 TC on both, indicating that the TC and TBC could be tuned independently. Finally, we compare the thermal resistance of MoS2_2 transistors on all substrates to show that MoS2_2 TBC is the most important parameter for heat removal for long-channel (> 150 nm) devices, while TBC and TC are equally important for short channels. This work provides important insights for electro-thermal applications of 2D materials on various substrates.

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