Parallel and series conduction model in Topological Insulators
In the past few years there has been a surge in the material science engineering in order to synthesize bulk insulating and surface metallic Topological Insulating (TI) materials. This quest is not only theoretically important but also promising from the novel application perspective. The dependence of temperature on resistance (R-T) of a particular sample reveals a plethora of information about the electronic properties especially in a unique sample like TI where there are two components comprising of an insulating bulk and metallic surface states. Depending on the amount of intrinsic doping during the sample formation, the bulk can either couple or remain decoupled with the surface. The former leads to a metallic R-T profile whereas the latter is captured by an insulating R-T behavior. These two behaviors can be represented by series and parallel resistor models respectively. In this work we study the R-T behavior in the framework of resistor models capturing the essential features of our sample.