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C. Krzeminski

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2 published item(s)

preprint2013arXiv

Nanoelectronics

In this chapter we intend to discuss the major trends in the evolution of microelectronics and its eventual transition to nanoelectronics. As it is well known, there is a continuous exponential tendency of microelectronics towards miniaturization summarized in G. Moore's empirical law. There is consensus that the corresponding decrease in size must end in 10 to 15 years due to physical as well as economical limits. It is thus necessary to prepare new solutions if one wants to pursue this trend further. One approach is to start from the ultimate limit, i.e. the atomic level, and design new materials and components which will replace the present day MOS (metal-oxide-semi- conductor) based technology. This is exactly the essence of nanotechnology, i.e. the ability to work at the molecular level, atom by atom or molecule by molecule, to create larger structures with fundamentally new molecular orga- nization. This should lead to novel materials with improved physical, chemi- cal and biological properties. These properties can be exploited in new devices. Such a goal would have been thought out of reach 15 years ago but the advent of new tools and new fabrication methods have boosted the field. We want to give here an overview of two different subfields of nano- electronics. The first part is centered on inorganic materials and describes two aspects: i) the physical and economical limits of the tendency to miniaturiza- tion; ii) some attempts which have already been made to realize devices with nanometric size. The second part deals with molecular electronics, where the basic quantities are now molecules, which might offer new and quite interest- ing possibilities for the future of nanoelectronics

preprint2012arXiv

Understanding of the Retarded Oxidation Effects in Silicon Nanostructures

In-depth understanding of the retarded oxidation phenomenon observed during the oxidation of silicon nanostructures is proposed. The wet thermal oxidation of various silicon nanostructures such as nanobeams, concave/convex nanorings and nanowires exhibits an extremely different and complex behavior. Such effects have been investigated by the modeling of the mechanical stress generated during the oxidation process explaining the retarded regime. The model describes the oxidation kinetics of silicon nanowires down to a few nanometers while predicting reasonable and physical stress levels at the Si/SiO$_{2}$ interface by correctly taking into account the relaxation effects in silicon oxide through plastic flow.