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C. Dunscombe

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2 publications

preprint2014arXiv

A Strained Silicon Cold Electron Bolometer using Schottky Contacts

We describe optical characterisation of a Strained Silicon Cold Electron Bolometer (CEB), operating on a 350 mK350~\mathrm{mK} stage, designed for absorption of millimetre-wave radiation. The silicon Cold Electron Bolometer utilises Schottky contacts between a superconductor and an n++ doped silicon island to detect changes in the temperature of the charge carriers in the silicon, due to variations in absorbed radiation. By using strained silicon as the absorber, we decrease the electron-phonon coupling in the device and increase the responsivity to incoming power. The strained silicon absorber is coupled to a planar aluminium twin-slot antenna designed to couple to 160 GHz160~\mathrm{GHz} and that serves as the superconducting contacts. From the measured optical responsivity and spectral response, we calculate a maximum optical efficiency of 50 %50~\% for radiation coupled into the device by the planar antenna and an overall noise equivalent power (NEP), referred to absorbed optical power, of $1.1 \times 10^{-16}~\mathrm{\mbox{W Hz}^{-1/2}}$ when the detector is observing a 300 K300~\mathrm{K} source through a 4 K4~\mathrm{K} throughput limiting aperture. Even though this optical system is not optimised we measure a system noise equivalent temperature difference (NETD) of $6~\mathrm{\mbox{mK Hz}^{-1/2}}$. We measure the noise of the device using a cross-correlation of time stream data measured simultaneously with two junction field-effect transistor (JFET) amplifiers, with a base correlated noise level of $300~\mathrm{\mbox{pV Hz}^{-1/2}}$ and find that the total noise is consistent with a combination of photon noise, current shot noise and electron-phonon thermal noise.

preprint2013arXiv

The electron-phonon relaxation time in thin superconducting titanium nitride films

We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T-3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.

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