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Researcher profile

Alexander Gerber

Alexander Gerber contributes to research discovery and scholarly infrastructure.

ResearcherAffiliation not importedOpen to collaborate
cond-mat.mtrl-sciphysics.app-ph

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2 published item(s)

preprint2020arXiv

High mobility conducting channel at semi-insulating GaAs -- metal oxide interfaces

Absence of an efficient technology of GaAs passivation limits the use of III-V semiconductors in modern electronics. The effect reported here can possibly lead to a solution of this long standing problem. We found that an electrically conducting interfacial channel is formed when insulating metal oxide dielectrics are deposited on untreated semi-insulating GaAs wafers by reactive RF sputtering in argon/oxygen plasma. The conducting channel is n-type with the surface charge density of 10^7 to 10^10 cm^-2 and Hall mobility as high as 6000 cm^2/Vsec, depending on the RF plasma excitation power and oxygen content during the deposition. The conducting channel is formed by depositing any of the tested metal oxide dielectrics: MgO, SiO2, Al2O3 and HfO2.

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preprint2020arXiv

Positive versus negative resistance response to hydrogenation in palladium and its alloys

Resistive solid state sensors are widely used in multiple applications, including molecular and gas detection. Absorption or intercalation of the target species varies the lattice parameters and an effective thickness of thin films, which is usually neglected in analyzing their transport properties in general and the sensor response in particular. Here, we explore the case of palladium-based thin films absorbing hydrogen and demonstrate that expansion of thickness is an important mechanism determining the magnitude and the very polarity of the resistance response to hydrogenation in high resistivity films. The model of the resistance response that takes into account modifications of thickness was tested and confirmed in three Pd-based systems with variable resistivity: thin Pd films above and below the percolation threshold, thick Pd-SiO2 granular composite films with different content of silica, and Pd-rich CoPd alloys where resistivity depends on Co concentration. Superposition of the bulk resistivity increase due to hydride formation and decrease of film resistance due to thickness expansion provides a consistent explanation of the hydrogenation response in both continuous and discontinuous films with different structures and compositions.

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