Abstract
Magnetron sputtering has also been used to deposit thin films of some materials and it has significant technological importance. A modeling on deposition of epitaxial thin films of Yttrium Stabilized Zirconia (YSZ) was done the diffusion of adatom on the surface were studies. There exists a strong interaction of ions formed in the plasma during the sputtering process. Cu thin films were deposited on Si. Nanocomposite thin film of SiCN showed dendritic growth.
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