Abstract
The LaAlO3/SrTiO3 (001) thin film materials system was studied using in situ, simultaneous x-ray diffuse scattering and specular reflectivity during pulsed laser deposition. Using this method, we are able to measure the time dependence of the characteristic surface length scale and the characteristic time for both in-plane and downhill diffusion. These data allow for the determination of the activation energy for various diffusion processes as a function of LaAlO3 thickness. Additionally, we show that the downhill diffusion rate of the first monolayer is distinctly different than subsequent layers. These results are directly compared to previous experimental observations seen during the deposition of homoepitaxial SrTiO3 (001).
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