Paper detail

Thermal annealing of sputtered Nb3Sn and V3Si thin films for superconducting radio-frequency cavities

Nb3Sn and V3Si thin films are promising candidates as thin films for the next generation of superconducting radio-frequency (SRF) cavities. However, sputtered films often suffer from stoichiometry and strain issues during deposition and post annealing. In this study, we explore the structural and chemical effects of thermal annealing, both in-situ and post-sputtering, on DC-sputtered Nb3Sn and V3Si films of varying thickness on Nb or Cu substrates, extending from our initial studies [1]. Through annealing at 950 °C, we successfully enabled recrystallization of 100 nm thin Nb3Sn films on Nb substrate with stoichiometric and strain-free grains. For 2 um thick films, we observed the removal of strain and a slight increase in grain size with increasing temperature. Annealing enabled a phase transformation from unstable to stable structure on V3Si films, while we observed significant Sn loss in 2 um thick Nb3Sn films after high temperature anneals. We observed similar Sn and Si loss on films atop Cu substrates during annealing, likely due to Cu-Sn and Cu-Si phase generation and subsequent Sn and Si evaporation. These results encourage us to refine our process to obtain high-quality sputtered films for SRF use.