The stability of the fractional quantum Hall effect in topological insulators

preprint2011arXivOpen access

Abstract

With the recent observation of graphene-like Landau levels at the surface of topological insulators, the possibility of fractional quantum Hall effect, which is a fundamental signature of strong correlations, has become of interest. Some experiments have reported intra-Landau level structure that is suggestive of fractional quantum Hall effect. This paper discusses the feasibility of fractional quantum Hall effect from a theoretical perspective, and argues that while this effect should occur, ideally, in the n=0n=0 and ∣n∣=1|n|=1 Landau levels, it is ruled out in higher ∣n∣|n| Landau levels. Unlike graphene, the fractional quantum Hall effect in topological insulators is predicted to show an interesting asymmetry between n=1n=1 and n=−1n=-1 Landau levels due to spin-orbit coupling.

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