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Nanomorphology of Annealed P3HS and P3HS:PCBM Films for OPV Applications

Atomic Force Microscopy (AFM) and Grazing Incidence X-Ray Diffraction (GI-XRD) are used to characterize the nanomorphology of spin-coated low (LMW, Mn = 12 kg/mol, regioregularity RR = 84%) and high (HMW, Mn = 39 kg/mol, RR = 98%) molecular weight poly(3-hexylselenophene) (P3HS) films and blend films of P3HS with [6,6]-phenyl-C61-butyric acid methyl ester (PCBM), before and after thermal annealing at 250 °C.

preprint2014arXivOpen access
Samuele LilliuMejd AlsariMarcus S. DahlemJ. Emyr Macdonald
cond-mat.softcond-mat.mtrl-sci
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Samuele LilliuMejd AlsariMarcus S. DahlemJ. Emyr Macdonald

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