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AuthorshipAuthorshipAuthorshipAuthorshipAuthorshipDo ImADo ImResearcherSelf-bias Dependence on Process Parameters in Asymmetric Cylindrical Coaxial Capacitively Coupled PlasmaWSelf-bias Dependence on...preprint / 2015Plasma Processing of Large Curved Surfaces for SRF Cavity ModificationWPlasma Processing of La...preprint / 2014Etching Mechanism of Niobium in Coaxial Ar/Cl2 RF PlasmaWEtching Mechanism of Ni...preprint / 2014Reversal of the Asymmetry in a Cylindrical Coaxial Capacitively Coupled Ar/Cl2 PlasmaWReversal of the Asymmet...preprint / 2015Apparatus and method for plasma processing of SRF cavitiesWApparatus and method fo...preprint / 2015
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PaperSelf-bias Dependence on Process Parameters in Asymmetric Cylindrical Coaxial Capacitively Coupled PlasmaAuthorship / preprint / 2015PaperPlasma Processing of Large Curved Surfaces for SRF Cavity ModificationAuthorship / preprint / 2014PaperEtching Mechanism of Niobium in Coaxial Ar/Cl2 RF PlasmaAuthorship / preprint / 2014PaperReversal of the Asymmetry in a Cylindrical Coaxial Capacitively Coupled Ar/Cl2 PlasmaAuthorship / preprint / 2015PaperApparatus and method for plasma processing of SRF cavitiesAuthorship / preprint / 2015

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