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Xiaochun Huang

Xiaochun Huang contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2025arXiv

Flexoelectric Polarization Enhancement in Paraelectric $\mathrm{BaHfO_3}$ via Strain Gradient Engineering

Flexoelectricity - polarization induced by strain gradients - offers a route to polar functionality in centrosymmetric dielectrics, where traditional piezoelectric effects are absent. This study investigates the flexoelectric effect in epitaxial $\mathrm{BaHfO_3}$ (BHO) thin films, a centrosymmetric and paraelectric perovskite. While a large lattice mismatch induces defect-driven relaxation, a coherently grown BHO film undergoes elastic relaxation, forming intrinsic strain gradients exceeding $10^5\ \mathrm{m}^{-1}$. A 29-fold enhancement in spontaneous polarization is observed at an electric field of $4\ \mathrm{MV\,cm}^{-1}$ for BHO exhibiting a strain gradient compared to relaxed BHO. This enhancement is attributed to flexoelectric coupling, which is isolated from ferroelectric and piezoelectric contributions due to the centrosymmetric nature and the absence of phase transitions in BHO. The findings establish a clear link between engineered strain gradients and enhanced polarizability in oxide thin films, offering a benchmark system for deconvoluting the flexoelectric effect from other polar effects. These results provide a basis for exploiting flexoelectricity in dielectric devices and advance the fundamental understanding of strain-coupled phenomena in functional oxides.

preprint2022arXiv

Epitaxial growth of a two-dimensional topological insulator candidate: monolayer Si2Te2

Hexagonal Si2Te2 monolayers (ML-Si2Te2) were predicted to show strain-dependent band-crossover between semiconducting and room-temperature quantum spin Hall phases. However, investigations on this artificial two-dimensional (2D) material have mainly been restricted to theoretical calculations because its bulk counterpart does not exist naturally. Here, we report on the successful epitaxial growth of ML-Si2Te2 films on Sb2Te3 thin film substrates. High-quality (1*1) ML-Si2Te2 films with a coverage as high as 95% were obtained as revealed by scanning tunneling microscopy. X-ray photoelectron spectroscopy confirms the absence of intermixing between Si2Te2 and Sb2Te3 at the interface. By combining scanning tunneling spectroscopy with density functional theory calculations, we demonstrate the semiconducting band structure of ML-Si2Te2 on Sb2Te3. Furthermore, it is theoretically predicted that the system can be driven into the nontrivial phase via reducing the strain by 4.4% using strain engineering. Our results pave the way for in-depth investigations on this 2D topological insulator candidate.