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Wilfrid Poirier

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cond-mat.mes-hall cond-mat.mtrl-sci

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preprint2020arXiv

Quantitative measurement of the thermal contact resistance between a glass microsphere and a plate

Accurate measurements of the thermal resistance between micro-objects made of insulating materials are complex because of their small size, low conductivity, and the presence of various ill-defined gaps. We address this issue using a modified scanning thermal microscope operating in vacuum and in air. The sphere-plate geometry is considered. Under controlled heating power, we measure the temperature on top of a glass microsphere glued to the probe as it approaches a glass plate at room temperature with nanometer accuracy. In vacuum, a jump is observed at contact. From this jump in temperature and the modeling of the thermal resistance of a sphere, the sphere-plate contact resistance $R_K=(1.4 \pm 0.18)\times10^7 \ \mathrm{K.W^{-1}}$ and effective radius $r=(36 \pm 4)$ nm are obtained. In air, the temperature on top of the sphere shows a decrease starting from a sphere-plate distance of 200 $\mathrm{μm}$ . A jump is also observed at contact, with a reduced amplitude. The sphere-plate coupling out of contact can be described by the resistance shape factor of a sphere in front of a plate in air, placed in a circuit involving a series and a parallel resistance that are determined by fitting the approach curve. The contact resistance in air $R^*_K=(1.2 \pm 0.46)\times 10^7 \ \mathrm{K.W^{-1}}$ is then estimated from the temperature jump. The method is quantitative without requiring any tedious multiple-scale numerical simulation, and is versatile to describe the coupling between micro-objects from large distances to contact in various environments.

preprint2013arXiv

Quantum resistance standard accuracy close to the zero-dissipation state

We report on a comparison of four GaAs/AlGaAs-based quantum resistance standards using an original technique adapted from the well-known Wheatstone bridge. This work shows that the quantized Hall resistance at Landau level filling factor $ν=2$ can be reproducible with a relative uncertainty of $32\times 10^{-12}$ in the dissipationless limit of the quantum Hall effect regime. In the presence of a very small dissipation characterized by a mean macroscopic longitudinal resistivity $\bar{R_{xx}(B)}$ of a few $μΩ$ , the discrepancy $ΔR_{\mathrm{H}}(B)$ measured on the Hall plateau between quantum Hall resistors turns out to follow the so-called resistivity rule $\bar{R_{xx}(B)}=αB\times d(ΔR_{\mathrm{H}}(B))/dB$ . While the dissipation increases with the measurement current value, the coefficient $α$ stays constant in the range investigated ( $40-120 \mathrm{μA}$ ). This result enlightens the impact of the dissipation emergence in the two-dimensional electron gas on the Hall resistance quantization, which is of major interest for the resistance metrology. The quantum Hall effect is used to realize a universal resistance standard only linked to the electron charge \emph{e} and the Planck's constant \emph{h} and it is known to play a central role in the upcoming revised \emph{Système International} of units. There are therefore fundamental and practical benefits in testing the reproducibility property of the quantum Hall effect with better and better accuracy.

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