Nitrogenated, Phosphorated and Arsenicated Monolayer Holey Graphenes
Motivated by a recent experiment that reported the synthesis of a new 2D material nitrogenated holey graphene (C$_2$N) [Mahmood \textit{et al., Nat. Comm.}, 2015, \textbf{6}, 6486], electronic, magnetic, and mechanical properties of nitrogenated (C$_2$N), phosphorated (C$_2$P) and arsenicated (C$_2$As) monolayer holey graphene structures are investigated using first-principles calculations. Our total energy calculations indicate that, similar to the C$_2$N monolayer, the formation of the other two holey structures are also energetically feasible. Calculated cohesive energies for each monolayer show a decreasing trend going from C$_2$N to C$_2$As structure. Remarkably, all the holey monolayers are direct band gap semiconductors. Regarding the mechanical properties (in-plane stiffness and Poisson ratio), we find that C$_2$N has the highest in-plane stiffness and the largest Poisson ratio among the three monolayers. In addition, our calculations reveal that for the C$_2$N, C$_2$P and C$_2$As monolayers, creation of N and P defects changes the semiconducting behavior to a metallic ground state while the inclusion of double H impurities in all holey structures results in magnetic ground states. As an alternative to the experimentally synthesized C$_2$N, C$_2$P and C$_2$As are mechanically stable and flexible semiconductors which are important for potential applications in optoelectronics.