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S. C. Bodepudi

S. C. Bodepudi contributes to research discovery and scholarly infrastructure.

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cond-mat.mes-hall cond-mat.mtrl-sci cond-mat.other

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preprint2014arXiv

Giant Current-Perpendicular-to-Plane Magnetoresistance in Multilayer Graphene as Grown on Nickel

Strong magnetoresistance effects are often observed in ferromagnet-nonmagnet multilayers, which are exploited in state-of-the-art magnetic field sensing and data storage technologies. In this work we report a novel current-perpendicular-to-plane magnetoresistance effect in multilayer graphene as grown on a catalytic nickel surface by chemical vapor deposition. A negative magnetoresistance effect of 10^4% has been observed, which persists even at room temperature. This effect is correlated with the shape of the 2D peak as well as with the occurrence of D peak in the Raman spectrum of the as-grown multilayer graphene. The observed magnetoresistance is extremely high as compared to other known materials systems for similar temperature and field range and can be qualitatively explained within the framework of "interlayer magnetoresistance" (ILMR).

preprint2011arXiv

Fabrication of hexagonally ordered nanopores in anodic alumina: An alternative pretreatment

Anodic aluminum oxide (AAO) or anodic alumina template containing hexagonally ordered nanopores has been widely used over the last decade for the development of numerous functional nanostructures such as nanoscale sensors, computing networks and memories. The long range pore order requires the starting aluminum surface to be extremely smooth. Electropolishing is the most commonly used method for surface planarization prior to anodization. While prevalent, this method has several limitations in terms of throughput, polishing area and requirement of special experimental setups, which introduce additional speed bottlenecks in the intrinsically slow AAO-based nanofabrication process. In this work we report a new generation of the so-called "chemical polishing" approach which circumvents these stumbling blocks in the pretreatment phase and offers a viable, simpler, safer and faster alternative to electropolishing. These benefits are obtained without sacrificing the quality of the final AAO template. In this work we have (a) identified the optimum parameter regime for chemical polishing and (b) determined process conditions for which a novel parallel nanoridge configuration self-assembles and extends over a distance of several microns. Such patterns can be used as a mask for fabricating nanocrossbars, which are the main structural components in myriad nanoscale memories and crosspoint architectures.