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Rui-Xuan Huang

Rui-Xuan Huang appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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2 published item(s)

preprint2016arXiv

Simulation Study on the Emittance Compensation of Off-axis Emitted Beam in RF Photoinjector

To make full use of photocathode material and improve its quantum efficiency lifetime, it can be necessary to operate laser away from the cathode center in photoinjectors. In RF guns, the off-axis emitted beam will see a time-dependent RF effect, which would generate a significant growth in transverse emittance. It has been demonstrated that such an emittance growth can be almost completely compensated by orienting the beam on a proper orbit in the downstream RF cavities along the injector. In this paper we analyze in detail the simulation techniques used in reference[1] and the issues associated with them. The optimization of photoinjector systems involving off-axis beams is a challenging problem. To solve this problem, one needs advanced simulation tools including both genetic algorithms and an efficient algorithm for 3D space charge. In this paper, we report on simulation studies where the two codes ASTRA and IMPACT-T are used jointly to overcome these challenges, in order to optimize a system designed to compensate for the emittance growth in a beam emitted off axis.

preprint2013arXiv

Velocity bunching in travelling wave accelerator with low acceleration gradient

We present the analytical and simulated results concerning the influences of the acceleration gradient in the velocity bunching process, which is a bunch compression scheme that uses a traveling wave accelerating structure as a compressor. Our study shows that the bunch compression application with low acceleration gradient is more tolerant to phase jitter and more successful to obtain compressed electron beam with symmetrical longitudinal distribution and low energy spread. We also present a transverse emittance compensation scheme to compensate the emittance growth caused by the increasing of the space charge force in the compressing process that is easy to be adjusted for different compressing factors.