Source author record

Quan-shui Zheng

Quan-shui Zheng appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record

Catalog footprint

What is connected

2works
2topics
4close collaborators

Actions

Connect this record

Log in to claim

Research graph

See the researcher in context

Open full explorer

Inspect adjacent papers, topics, institutions and collaborators without losing the researcher page.

Building this map preview

BZPEER is loading the nearby papers, people, topics and institutions for this page.

Published work

2 published item(s)

preprint2014arXiv

Mechanical buckling induced periodic kinking/stripe microstructures in mechanically peeled graphite flakes from HOPG

Mechanical exfoliation is a widely used method to isolate high quality graphene layers from bulk graphite. In our recent experiments, some ordered microstructures, consisting of a periodic alternation of kinks and stripes, were observed in thin graphite flakes that were mechanically peeled from highly oriented pyrolytic graphite (HOPG). A theoretical model is presented in this paper to understand the formation of such ordered microstructures, based on elastic buckling of a graphite flake being subjected to a bending moment. The width of the stripes predicted from this model agrees reasonably well with our experimental measurements.

preprint2010arXiv

Graphite Nanoeraser

We present here a method for cleaning intermediate-size (5~50nm) contamination from highly oriented pyrolytic graphite. Electron beam deposition causes a continuous increase of carbonaceous material on graphene and graphite surfaces, which is difficult to remove by conventional techniques. Direct mechanical wiping using a graphite nanoeraser is observed to drastically reduce the amount of contamination. After the mechanical removal of contamination, the graphite surfaces were able to self-retract after shearing, indicating that van der Waals contact bonding is restored. Since contact bonding provides an indication of a level of cleanliness normally only attainable in a high-quality clean-room, we discuss potential applications in preparation of ultraclean surfaces.