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Researcher profile

Paul B. Welander

Paul B. Welander contributes to research discovery and scholarly infrastructure.

ResearcherAffiliation not importedOpen to collaborate
cond-mat.supr-concond-mat.mtrl-sciquant-ph

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Published work

6 published item(s)

preprint2012arXiv

Driven dynamics and rotary echo of a qubit tunably coupled to a harmonic oscillator

We have investigated the driven dynamics of a superconducting flux qubit that is tunably coupled to a microwave resonator. We find that the qubit experiences an oscillating field mediated by off-resonant driving of the resonator, leading to strong modifications of the qubit Rabi frequency. This opens an additional noise channel, and we find that low-frequency noise in the coupling parameter causes a reduction of the coherence time during driven evolution. The noise can be mitigated with the rotary-echo pulse sequence, which, for driven systems, is analogous to the Hahn-echo sequence.

0 citations0 reviewsNo code linkedOpen access
preprint2012arXiv

Shadow evaporation of epitaxial Al/Al2O3/Al tunnel junctions on sapphire utilizing an inorganic bilayer mask

This letter describes a new inorganic shadow mask that has been employed for the evaporation of all-epitaxial Al/Al2O3/Al superconducting tunnel junctions. Organic resists that are commonly used for shadow masks and other lift-off processes are not compatible with ultra-high vacuum deposition systems, and they can break down at even moderately elevated temperatures. The inorganic mask described herein does not suffer these same shortcomings. It was fabricated from a Ge/Nb bilayer, comprising suspended Nb bridges supported by an undercut Ge sacrificial layer. Utilizing such a bilayer mask on C-plane sapphire, the growth of epitaxial Al tunnel junctions was achieved using molecular beam epitaxy. Crystalline Al2O3 was grown diffusively at 300 C in a molecular oxygen background of 2.0 utorr, while amorphous oxide was grown at room temperature and 25 mtorr. A variety of analysis techniques were employed to evaluate the materials, and tunnel junction current-voltage characteristics were measured at millikelvin temperatures.

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preprint2011arXiv

Comment on "Twin symmetry texture of energetically condensed niobium thin films on sapphire substrates (a-plane Al2O3)" [J. Appl. Phys. 110, 033523 (2011)]

In their recent publication, Zhao et al. [J. Appl. Phys. 110, 033523 (2011)] claim to have found a new three-dimensional relationship for niobium-on-sapphire epitaxy. However, two critical errors were made in the analysis of x-ray diffraction measurements. The crystal structure of sapphire (alpha-Al2O3) was erroneously cited as hexagonal close-packed, and crystallographic orientations of sapphire were misidentified. Correcting these errors, one finds their claim unjustified.

0 citations0 reviewsNo code linkedOpen access
preprint2011arXiv

Study of loss in superconducting coplanar waveguide resonators

Superconducting coplanar waveguide (SCPW) resonators have a wide range of applications due to the combination of their planar geometry and high quality factors relative to normal metals. However, their performance is sensitive to both the details of their geometry and the materials and processes that are used in their fabrication. In this paper, we study the dependence of SCPW resonator performance on materials and geometry as a function of temperature and excitation power. We measure quality factors greater than $2\times10^6$ at high excitation power and $6\times10^5$ at a power comparable to that generated by a single microwave photon circulating in the resonator. We examine the limits to the high excitation power performance of the resonators and find it to be consistent with a model of radiation loss. We further observe that while in all cases the quality factors are degraded as the temperature and power are reduced due to dielectric loss, the size of this effect is dependent on resonator materials and geometry. Finally, we demonstrate that the dielectric loss can be controlled in principle using a separate excitation near the resonance frequencies of the resonator.

0 citations0 reviewsNo code linkedOpen access
preprint2010arXiv

Reduced leakage current in Josephson tunnel junctions with codeposited barriers

Josephson junctions were fabricated using two different methods of barrier formation. The trilayers employed were Nb/Al-AlOx/Nb on sapphire, where the first two layers were epitaxial. The oxide barrier was formed either by exposing the Al surface to O2 or by codepositing Al in an O2 background. The codeposition process yielded junctions that showed the theoretically predicted subgap current and no measurable shunt conductance. In contrast, devices with barriers formed by thermal oxidation showed a small shunt conductance in addition to the predicted subgap current.

0 citations0 reviewsNo code linkedOpen access
preprint2010arXiv

Structural evolution of Re (0001) thin films grown on Nb (110) surfaces by molecular beam epitaxy

The heteroepitaxial growth of Re (0001) films on Nb (110) surfaces has been investigated. Nb/Re bilayers were grown on A-plane sapphire -- alpha-Al2O3 (11-20) -- by molecular beam epitaxy. While Re grew with a (0001) surface, the in-plane epitaxial relationship with the underlying Nb could be best described as a combination of Kurdjumov-Sachs and Nishiyama-Wassermann orientations. This relationship was true regardless of Re film thickness. However, an evolution of the surface morphology with increasing Re thickness was observed, indicative of a Stranski-Krastanov growth mode. Re (0001) layers less than 15 nm thick were atomically smooth, with a typical rms roughness of less than 0.5 nm, while thicker films showed granular surface structures. And despite the presence of a substantial lattice misfit, the Re layer strain diminished rapidly and the Re lattice was fully relaxed by about 20 nm. The strain-free and atomically smooth surface of thin Re overlayers on Nb is ideal for the subsequent epitaxial growth of ultra-thin oxide tunnel barriers. Utilizing bcc/hcp (or bcc/fcc) heteroepitaxial pairs in advanced multi-layer stacks may enable the growth of all-epitaxial superconductor/insulator/superconductor trilayers for Josephson junction-based devices and circuits.

0 citations0 reviewsNo code linkedOpen access