Source author record

P. G. Callahan

P. G. Callahan appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record

Catalog footprint

What is connected

2works
1topics
4close collaborators

Actions

Connect this record

Log in to claim

Research graph

See the researcher in context

Open full explorer

Inspect adjacent papers, topics, institutions and collaborators without losing the researcher page.

Building this map preview

BZPEER is loading the nearby papers, people, topics and institutions for this page.

Published work

2 published item(s)

preprint2021arXiv

Observation of Bulk Plasticity in a Polycrystalline Titanium Alloy by Diffraction Contrast Tomography and Topotomography

The mechanical properties of polycrystalline metals are governed by the interaction of defects that are generated by deformation within the 3D microstructure. In materials that deform by slip, the plasticity is usually highly heterogeneous within the microstructure. Many experimental tools can be used to observe the results of slip events at the free surface of a sample; however, there are only a few methods for imaging these events in the bulk. In this article, the imaging of bulk slip events within the 3D microstructure are enabled by the combined use of X-ray diffraction contrast tomography and topotomography. Correlative measurements between high-resolution digital image correlation, X-ray diffraction contrast tomography, topotomography and phase contrast tomography are performed during deformation of Ti-7Al to investigate the sensitivity of the X-ray topotomography method for the observation of slip events in the bulk. Much larger neighborhoods of grains were able to be mapped than in previous studies, enabling quantitative measurements of slip transmission. Significant differences were observed between surface and bulk grains, indicating the need for 3D observations of plasticity to better understand deformation in polycrystalline materials.

preprint2016arXiv

On the limits to mobility in InAs quantum wells with nearly lattice-matched barriers

The growth and the density dependence of the low temperature mobility of a series of two-dimensional electron systems confined to un-intentionally doped, low extended defect density InAs quantum wells with Al$_{1-x}$Ga$_{x}$Sb barriers are reported. The electron mobility limiting scattering mechanisms were determined by utilizing dual-gated devices to study the dependence of mobility on carrier density and electric field independently. Analysis of the possible scattering mechanisms indicate the mobility was limited primarily by rough interfaces in narrow quantum wells and a combination of alloy disorder and interface roughness in wide wells at high carrier density within the first occupied electronic sub-band. At low carrier density the functional dependence of the mobility on carrier density provided evidence of coulombic scattering from charged defects. A gate-tuned electron mobility exceeding 750,000 cm$^{2}$/Vs was achieved at a sample temperature of 2 K.