Researcher profile

Nils von den Driesch

Nils von den Driesch contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2026arXiv

Electrical Control of Optically Active Single Spin Qubits in ZnSe

Electrons bound to shallow donors in ZnSe quantum wells are promising candidates for optically addressable spin qubits and single-photon sources. However, their optical coherence and indistinguishability are often limited by spectral broadening arising from charge fluctuations in the local environment. Here, we report electrical control of single donor qubits in ZnSe quantum wells. The applied field induces a DC Stark shift that tunes the emission energy over a range exceeding 30 times the inhomogeneous linewidth, effectively compensating for emitter-to-emitter variations. Concurrently, the field stabilizes trap occupancy, yielding a twofold reduction in optical linewidth and the suppression of spectral wandering. A statistical model based on trap dynamics qualitatively reproduces these observations and elucidates the mechanism of field-assisted charge noise suppression. Our results identify electrical control as a versatile pathway to significantly improve optical and spin addressability.

preprint2019arXiv

Thermally activated diffusion and lattice relaxation in (Si)GeSn materials

Germanium-Tin (GeSn) alloys have emerged as a promising material for future optoelectronics, energy harvesting and nanoelectronics owing to their direct bandgap and compatibility with existing Si-based electronics. Yet, their metastability poses significant challenges calling for in-depth investigations of their thermal behavior. With this perspective, this work addresses the interdiffusion processes throughout thermal annealing of pseudomorphic GeSn binary and SiGeSn ternary alloys. In both systems, the initially pseudomorphic layers are relaxed upon annealing exclusively via thermally induced diffusional mass transfer of Sn. Systematic post-growth annealing experiments reveal enhanced Sn and Si diffusion regimes that manifest at temperatures below 600°C. The amplified low-temperature diffusion and the observation of only subtle differences between binary and ternary hint at the unique metastability of the Si-Ge-Sn material system as the most important driving force for phase separation.