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Source author record

Nicolas Vandencasteele

Nicolas Vandencasteele appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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physics.plasm-phphysics.chem-ph

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Published work

4 published item(s)

preprint2016arXiv

Chemical and Physical Effects of the Carrier Gas on the Atmospheric Pressure PECVD of Fluorinated Precursors

The atmospheric pressure PECVD deposition and texturization of hydrophobic coatings using liquid fluorinated C6F12 and C6F14 precursors are investigated. The effect of the carrier gas (argon and helium) is discussed in terms of the behavior of the gas phase and of the characteristics of the deposited film. Mass spectrom-etry measurements indicate that the fragmentation is higher with argon while helium reacts very easily with oxygen impurities leading to the formation of CxFyOz compounds. These observations are consistent with the chemical composition of the films determined by XPS and the variation in the deposition rate. Moreover, the streamers present in the argon discharge affect the morphology of the surface by increasing the roughness, which leads to the increase in the hydrophobicity of the coatings.

0 citations0 reviewsNo code linkedOpen access
preprint2016arXiv

Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by atmospheric He-O$_2$ post-discharge

Among various surface modification techniques, plasma can be used as a source for tailoring the surface properties of diverse materials. HDPE and fluoropolymer surfaces have been treated by the post-discharge of an atmospheric RF-plasma torch supplied with helium and oxygen gases. The plasma-treated surfaces were characterized by measurements of mass losses, water contact angles, x-ray photoelectron spectroscopy and atomic force microscopy. This experimental approach correlated with an optical characterization of the plasma phase allowed us to propose etching mechanisms occurring at the post-discharge/polymer interface. We discuss how competitive and synergistic effects can result from the oxidation and/or the roughening of the surface but also from the excimer VUV radiation, the He metastable species and the O radicals reaching the plasma-polymer interface.

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preprint2016arXiv

Etching Processes of Polytetrafluoroethylene Surfaces Exposed to He and He-O2 Atmospheric Post-discharges

A comparative study of polytetrafluoroethylene (PTFE) surfaces treated by the post-discharge of He and He-O2 plasmas at atmospheric pressure is presented. The characterization of treated PTFE surfaces and the species involved in the surface modification are related. In pure He plasmas, no significant change of the surface has been observed by X-ray photoelectron spectroscopy (XPS), dynamic water contact angles (dWCA) and atomic force microscopy (AFM), in spite of important mass losses recorded. According to these observations, a layer-by-layer physical etching without any preferential orientation is proposed, where the highly energetic helium metastables are the main species responsible for the scission of --(CF2)n-- chains. In He--O 2 plasmas, as the density of helium metastables decreases as a function of the oxygen flow rate, the treatment leads to fewer species ejected from the PTFE surfaces (in agreement with mass loss measurements and the detection of fluorinated species onto aluminum foil). However, the dWCA and AFM measurements show an increase in the hydrophobicity and the roughness of the surface. The observed alveolar structures are assumed to be caused by an anisotropic etching where the oxygen atoms etch mainly the amorphous phase.

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preprint2016arXiv

Synthesis and texturization processes of (super)-hydrophobic fluorinated surfaces by atmospheric plasma

The synthesis and texturization processes of fluorinated surfaces by means of atmospheric plasma are investigated and presented through an integrated study of both the plasma phase and the resulting material surface. Three methods enhancing the surface hydrophobicity up to the production of super-hydrophobic surfaces are evaluated: (i) the modification of a polytetrafluoroethylene (PTFE) surface, (ii) the plasma deposition of fluorinated coatings and (iii) the incorporation of nanoparticles into those fluorinated films. In all the approaches, the nature of the plasma gas appears to be a crucial parameter for the desired property. Although a higher etching of the PTFE surface can be obtained with a pure helium plasma, the texturization can only be created if O2 is added to the plasma, which simultaneously decreases the total etching. The deposition of CxFy films by a dielectric barrier discharge leads to hydrophobic coatings with water contact angles (WCAs) of 115{\textdegree}, but only the filamentary argon discharge induces higher WCAs. Finally, nanoparticles were deposited under the fluorinated layer to increase the surface roughness and therefore produce super-hydrophobic hybrid coatings characterized by the nonadherence of the water droplet at the surface.

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