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Neil McN. Alford

Neil McN. Alford appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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Published work

2 published item(s)

preprint2016arXiv

Tunable, Low Optical Loss Strontium Molybdate Thin Films for Plasmonic Applications

Strontium molybdate (SrMoO3) thin films are shown to exhibit plasmonic behaviour with a zero crossover wavelength of the real part of the dielectric permittivity tunable between 600 and 950 nm (2.05 eV and 1.31 eV). The films are grown epitaxially on strontium titanate (SrTiO3), magnesium oxide (MgO), and lanthanum aluminate (LaAlO3) substrates by pulsed laser deposition. SrMoO3 is shown to have optical losses lower than those of gold at the point at which the real part of the dielectric permittivity is equal to -2, while possessing low electrical resistivity of 100E-6 Ohm cm at room temperature. Spectroscopic ellipsometry measurements reveal that SrMoO3 shows plasmonic behaviour, moreover we demonstrate that the epsilon near zero (ENZ) wavelength is tunable by engineering the residual strain in the films. The relatively broadband ENZ behaviour observed in SrMoO3 demonstrates its potential suitability for transformation optics along with plasmonic applications in the visible to near infrared spectral range.

preprint2005arXiv

Improving electrical properties of ferroelectric thin films by ultraviolet radiation

Ferroelectric films in the paraelectric phase exhibit two undesirable properties: hysteresis in the voltage-capacitance characteristics and a significant relaxation time of the capacitance. Our experiments show that suppression of both of these is achieved by using ultraviolet (UV) radiation with wavelengths corresponding to the material forbidden gap. Experimentally we also observed UV radiation induced modulation of thin film permittivity without an applied electric field. The observed phenomena are believed to have the same origin: UV light causes generation of non-equilibrium charge carriers and space charge redistribution inside thin ferroelectric films.