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Nazila Haratipour

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cond-mat.mes-hall

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preprint2016arXiv

Symmetric Complementary Logic Inverter Using Integrated Black Phosphorus and MoS2 Transistors

The operation of an integrated two-dimensional complementary metal-oxide-semiconductor inverter with well-matched input/output voltages is reported. The circuit combines a few-layer MoS2 n-MOSFET and a black phosphorus (BP) p-MOSFET fabricated using a common local backgate electrode with thin (20 nm) HfO2 gate dielectric. The constituent devices have linear threshold voltages of -0.8 V and +0.8 V and produce peak transconductances of 16 uS/um and 41 uS/um for the MoS2 n-MOSFET and BP p-MOSFET, respectively. The inverter shows a voltage gain of 3.5 at a supply voltage, VDD = 2.5 V, and has peak switching current of 108 uA and off-state current of 8.4 uA (2.4 uA) at VIN = 0 (VIN = 2.5 V). In addition, the inverter has voltage gain greater than unity for VDD > 0.5 V, has open butterfly curves for VDD > 1 V, and achieves static noise margin over 500 mV at VDD = 2.5 V. The voltage gain was found to be insensitive to temperature between 270 K and 340 K, and AC large and small-signal operation was demonstrated at frequencies up to 100 kHz. The demonstration of a complementary 2D inverter which operates in a symmetric voltage window suitable for driving a subsequent logic stage is a significant step forward in developing practical applications for devices based upon 2D materials.

preprint2015arXiv

Ambipolar Black Phosphorus MOSFETs with Record n-Channel Transconductance

Ambipolar black phosphorus MOSFETs with record n-channel extrinsic transconductance are reported. The devices consist of multi-layer black phosphorus aligned to a local back-gate electrode with 10-nm-thick HfO2 gate dielectric. Before passivation, devices with 0.3-um gate length behaved as p-MOSFETs with peak extrinsic transconductance, gm, of 282 uS/um at VDS = -2 V. After passivation, the same devices displayed ambipolar behavior, and when tested as n-MOSFETs, had peak gm = 66 uS/um at VDS = +2 V, and similar devices on the same wafer had gm as high as 80 uS/um. These results are an important step toward realization of high-performance black phosphorus complementary logic circuits.

preprint2015arXiv

Capacitive Sensing of Intercalated H2O Molecules Using Graphene

Understanding the interactions of ambient molecules with graphene and adjacent dielectrics is of fundamental importance for a range of graphene-based devices, particularly sensors, where such interactions could influence the operation of the device. It is well-known that water can be trapped underneath graphene and its host substrate, however, the electrical effect of water beneath graphene and the dynamics of how it changes with different ambient conditions has not been quantified. Here, using a metal-oxide-graphene variable-capacitor (varactor) structure, we show that graphene can be used to capacitively sense the intercalation of water between graphene and HfO2 and that this process is reversible on a fast time scale. Atomic force microscopy is used to confirm the intercalation and quantify the displacement of graphene as a function of humidity. Density functional theory simulations are used to quantify the displacement of graphene induced by intercalated water and also explain the observed Dirac point shifts as being due to the combined effect of water and oxygen on the carrier concentration in the graphene. Finally, molecular dynamics simulations indicate that a likely mechanism for the intercalation involves adsorption and lateral diffusion of water molecules beneath the graphene.

preprint2014arXiv

Black Phosphorus p-MOSFETs with High Transconductance and Nearly Ideal Subthreshold Slope

We report record performance for black phosphorus p-MOSFETs. The devices have locally patterned back gates and 20-nm-thick HfO2 gate dielectrics. Devices with effective gate length, Leff = 1.0 um display extrinsic transconductance, gm, of 101 uS/um at a drain-to-source bias voltage, Vds = -3 V. Temperature-dependent analysis also shows that the subthreshold slope, SS, is nearly ideal, with a minimum value of SS = 66 mV/decade at room temperature and Vds = -0.1 V. Furthermore, devices with 7-nm HfO2 dielectrics and Leff = 0.3 um displayed gm as high as 204 uS/um at Vds = -1.5 V.