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Maria Pintea

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Published work

3 published item(s)

preprint2022arXiv

Dissociative Electron Attachment Cross Sections for Ni(CO)4, Co(CO)3NO, Cr(CO)6

The Ni(CO)4, Cr(CO)6, Co(CO)3NO are some of the most common precursors used for the focused electron-induced deposition. Some of the compounds, even though extensively used have high requirements when it comes to handling, being explosives, highly flammable, and with high toxicity levels, as is the case of Ni(CO)4. We are employing simulations to determine values that are hard to determine experimentally, and compare them with DFT calculations and experimental data where available. Using Quantemol-N cross-sections simulations for dissociative electron attachment (DEA) at low electron energy, 0 - 20eV, gives valuable information on the fragmentation of the molecules, using their bond dissociation energies, electron affinities, and incident electron energies. The values obtained for the cross-sections are 0.12x10-18cm2 for Ni(CO)4, 4.5x10-16cm2 for Co(CO)3NO DEA cross-sections and 4.3x10-15cm2for Cr(CO)6.

preprint2022arXiv

Dissociative electron attachment to gold(i) based compounds: 4,5-dichloro 1,3-diethyl imidazolylidene trifluoromethyl gold(i)

With the use of proton-NMR and powder XRD (XRPD) studies, the suitability of specific Au FEBID precursors has been investigated to low electron energy, structure, excited states and resonances, structural crystal modifications, flexibility, and vaporization level. Uniquely designed precursor to meet the needs of focused electron beam induced deposition (FEBID) at the nanostructure level, the 4,5-dichloro 1,3-diethyl imidazolylidene trifluoromethyl gold(i) is a compound that proves its capability to create high purity structures, and its growing importance between other AuImx and AuClnB (where x, n are the number of radicals, B = CH, CH3 or Br) compounds in the radiation cancer therapy increases the efforts to design more suitable bonds in processes of SEM deposition and in gas-phase studies. The investigation done to its powder shape using the XRPD XPERT3 Panalytical diffractometer based on CoKα lines show changes to its structure with temperature, level of vacuum, and light; the sensitivity of this compound makes it highly interesting to radiation research in particular. Used for FEBID, through its smaller number of C, H, and O atoms has lower levels of C contamination in the structures and on the surface, but it replaces these bonds with C-Cl and C-N bonds that have a lower bond breaking energy but still needing an extra purification step in the deposition process, whether is H2O, O2 or H jets.

preprint2022arXiv

Structural Analysis of Si(OEt)4 Deposits on Au(111)/SiO2 Substrates at Nanometer Scale using Focused Electron Beam Induced Deposition

The focused electron beam induced deposition (FEBID) process was used by employing a Gemini SEM with a beam characteristic of 1keV and 24pA for the deposition of pillars and line shaped deposits with heights between 9nm to 1um and widths from 5nm to 0.5um. All structures have been analyzed to their composition looking at a desired Si : O : C content of 1: 2 : 0. The C content of the structure was found to be ~over 60% for older deposits kept in air (~at room temperature) and less than 50% for younger deposits, only 12 hours old. Using a deposition of Si(OEt)4 at high rates and a deposition temperature of under 0 degC, an Si content of our structure between 10at% and 15at% (compositional percentage) was obtained. The FEBID structures have been deposited on Au(111) over an SiO2 wafer. The Au(111) was chosen as a substrate for the deposition of Si(OEt)4 due to its structural and morphological properties, with its surface granulation following a Chevron pattern, and the Au(111) defects having a higher contribution to the change in the composition of the final content of the structure with the increase in O ratio and a reduction in the shapes heights.